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Aasutosh D. Dave
Observed names:
A. D. Dave,
Aasutosh Dave
Institution:
Mentor Graphics (United States)
Observed institutions:
The University of Texas at Arlington,
Advanced Micro Devices (United States),
Mentor Graphics (United States)
OpenAlex ID:
A5022522464
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
2010
·
David Melville
, Alan E. Rosenbluth
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
23
22-nm-node technology active-layer patterning for planar transistor devices
2010
·
Ryoung-Han Kim
, Steven J. Holmes
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
9
The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-contours from wafer and mask
2011
·
Daisuke Hibino
, Hiroyuki Shindo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Applicability of global source mask optimization to 22/20nm node and beyond
2011
·
Kehan Tian
, Moutaz Fakhry
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
22 nm technology node active layer patterning for planar transistor devices
2009
·
Ryoung-Han Kim
, Steven Holmes
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Full-chip correction of implant layer accounting for underlying topography
2012
·
Minchul Oh
, Hyungjoo Youn
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and mask
2011
·
Daisuke Hibino
, Yutaka Hojyo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Pushing the limits of RET with different illumination optimization methods
2009
·
Aasutosh D. Dave
, Ryoung-Han Kim
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Methods and factors to optimize OPC run-time
2007
·
A. D. Dave
, C. P. Babcock
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Wafer-level self-packaged infrared microsensors
2004
·
Aamer Mahmoud
, Aasutosh Dave
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Compatibility of optimized source over design changes in the foundry environment
2013
·
Jojo Pei
, Feng Shao
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Influence of the illumination source on model-based SRAF placement
2011
·
Rachit Gupta
, Aasutosh Dave
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry
2009
·
Aasutosh D. Dave
, Oleg Kritsun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Introducing a novel flow to estimate challenges encountered while transitioning from RET development to manufacturable solution
2013
·
Jacky Cheng
, Robin Chia
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Towards the prediction of pattern collapse hotspots for full-chip layouts
2011
·
John L. Sturtevant
, Aasutosh Dave
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Impact of illumination on model-based SRAF placement for contact patterning
2010
·
John L. Sturtevant
, Srividya Jayaram
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Micromachined infrared sensors with device-level encapsulation
2005
·
Aasutosh Dave
, Zeynep Celik-Butler
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
New methodology to predict pattern collapse for 14nm and beyond
2012
·
Aasutosh Dave
, Kenji Yoshimoto
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Comparison of rule-based versus model-based decomposition technique
2009
·
Pat LaCour
, Aasutosh Dave
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
19
Citation count:
90
H-index:
5
I10-index:
1
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