Author

R. R. Kola

Observed names: KOLA,RATNAJI RAO, Kola, R. R., Kola, R.R., R. Kola, R.R Kola, R.R. Kola, R.Rao Kola, RR Kola, Ratnaji R. Kola

Observed institutions: Universidad de Valladolid, AT&T (United States), North Carolina State University, Lawrence Berkeley National Laboratory, Alcatel-Lucent (France), Texas Instruments (United States), University of California, Berkeley

OpenAlex ID: A5029379531

Stress relaxation in Mo/Si multilayer structures

1992 · R. R. Kola, D. L. Windt, et al. · Applied Physics Letters · 51

An examination of class A to class M transition in Pb-9Sn and other alloys

1986 · Tsang-Tse Fang, R.Rao Kola, et al. · Metallurgical Transactions A · 33

Stable low-stress tungsten absorber technology for sub-half-micron x-ray lithography

1991 · R. R. Kola, G. K. Celler, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 28

Transition metal silicide precipitation in silicon induced by rapid thermal processing and free-surface gettering

1989 · R. R. Kola, G. A. Rozgonyi, et al. · Applied Physics Letters · 27

Defect engineering for VLSI epitaxial silicon

1987 · G.A. Rozgonyi, A.S.M. Salih, et al. · Journal of Crystal Growth · 27

Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique

1991 · J. A. Liddle, H. A. Huggins, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 25

Use of anodic tantalum pentoxide for high-density capacitor fabrication

1999 · S. Duen~as, E. Casta´n, et al. · Journal of Materials Science Materials in Electronics · 24

Stress and microstructure of sputter-deposited thin films: Molecular dynamics simulations and experiment

1993 · C. C. Fang, F. Jones, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 22

Tungsten patterning for 1:1 x-ray masks

1991 · C. W. Jurgensen, R. R. Kola, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 21

Microstructure of Ta2O5 films grown by the anodization of TaNx

1998 · D.J. Werder, R.R. Kola · Thin Solid Films · 19

Tantalum pentoxide obtained from TaNx and TaSi2 anodisation: an inexpensive and thermally stable high k dielectric

2001 · S. Dueñas, E. Castán, et al. · Solid-State Electronics · 11

Marks for alignment and registration in projection electron lithography

1993 · R. C. Farrow, J. A. Liddle, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11

Electrical characteristics of anodic tantalum pentoxide thin films under thermal stress

2000 · S Dueñas, H Castán, et al. · Microelectronics Reliability · 10

Creep and Yield Loci of Zircaloy Cladding at Elevated Temperatures

1987 · K. Linga Murty, Ratnaji R. Kola, et al. · Texture Stress and Microstructure · 10

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Stress free and moisture insensitive silicon oxide dielectric films formed by molecular-beam deposition

1995 · Naresh Chand, R. R. Kola, et al. · Journal of Applied Physics · 8

Formation of monolithic masks for 0.25 μm x-ray lithography

1991 · G. K. Celler, L. E. Trimble, et al. · Applied Physics Letters · 8

Thin film resistors and capacitors for advanced packaging

2002 · R.R. Kola, M.Y. Lau, et al. · International Symposium on Advanced Packaging Materials · 7

Mark detection for alignment and registration in a high-throughput projection electron lithography tool

1992 · R. C. Farrow, J. A. Liddle, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 7

Roughness Effects During Focused Ion Beam Repair of X-Ray Masks with Polycrystalline Tungsten Absorbers

1992 · R. R. Kola, G. K. Celler, et al. · MRS Proceedings · 7

Patterning of x-ray masks using the negative-acting resist P(SI-CMS)

1993 · D. A. Mixon, A. E. Novembre, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

Microstructural Evolution and Stress Relaxation in Sputtered Tungsten Films

1993 · F. M. Ross, R. R. Kola, et al. · MRS Proceedings · 6

Masks for x-ray lithography with a point source stepper

1992 · G. K. Celler, C. Biddick, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

Fabrication of Ta2O5 Thin Films by Anodic Oxidation of Tantalum Nitride and Tantalum Silicide: Growing Mechanisms, Electrical Characterization and ULSI M-I-M Capacitor Performances

1999 · S. Dueñas, H. Castán, et al. · MRS Proceedings · 5

Thermal wave imaging of misfit dislocations and correlation with minority carrier lifetime

1990 · A. Bivas, W. Lee Smith, et al. · Journal of Crystal Growth · 4

DLTS and conductance transient investigation on defects in anodic tantalum pentoxide thin films

2001 · S. Dueñas, H. Castán, et al. · Journal of Materials Science Materials in Electronics · 3

Works count: 54

Citation count: 414

H-index: 11

I10-index: 14