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Russ Westerman

Observed names: R. Westerman, R.J. Westerman, Russ J. Westerman, Russell J. Westerman, Russell Westerman
Observed institution: Oerlikon (United States)
ORCID: 0000-0002-6236-741X
Observed ORCID: 0000-0002-6236-741X
OpenAlex ID: A5058672350
Aspect ratio dependent etching lag reduction in deep silicon etch processes
2006 · S. L. Lai, D. Johnson, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 119
Stress Control of Si-based PECVD Dielectrics
2006 · Kenneth Mackenzie, David Johnson, et al. · ECS Meeting Abstracts · 43
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Mechanism of high density plasma processes for ion-driven etching of materials
1999 · J.W. Lee, J.F. Donohue, et al. · Solid-State Electronics · 14
Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads
1999 · Chris Constantine, Russell J. Westerman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Smooth, low rate, selective GaN/AlGaN etch
2021 · Mohammadsadegh Beheshti, Russell Westerman · AIP Advances · 9
Plasma-based die singulation processing technology
2014 · Kenneth D. Mackenzie, David Pays-Volard, et al. · IEEE Electronic Components and Technology Conference (ECTC) · 9
Scalloping minimization in deep Si etching on Unaxis DSE tools
2003 · Shouliang Lai, Dave J. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Plasma Dicing: Current State & Future Trends
2015 · Russ Westerman, Gordon Grivna, et al. · ECS Transactions · 6
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Deep silicon etching: current capabilities and future directions
2014 · Russ Westerman, Linnell Martinez, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Plasma etching of Cr: a multiparameter uniformity study utilizing patterns of various Cr loads
1999 · Chris Constantine, Russell J. Westerman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Endpoint detection methods for time division multiplex etch processes
2006 · Russ Westerman, Dave Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Notch reduction in silicon on insulator (SOI) structures using a time division multiplex etch processes
2005 · Shouliang Lai, Sunil Srinivasan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions
1997 · Chris Constantine, David J. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Plasma etching of Cr photomasks: optimization of process conditions and CD control
1997 · Chris Constantine, David J. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Inductively coupled plasma etch of DUV MoSi photomasks: a designed study of etch chemistries and process results
1998 · Chris Constantine, David J. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Smooth, anisotropic etching of indium containing structures using a high density ICP system
2003 · Y.-S. Lee, M. DeVre, et al. · Conference proceedings. ... International Conference on Indium Phosphide and Related Materials · 2
Eliminating Pillars During GaAs Via Etch Formation
2003 · Russ Westerman, D. J. Johnson, et al. · 2
Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: III
2001 · Chris Constantine, Russell J. Westerman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Advanced photomask chrome etch: selectivity without sacrifice
2017 · Michael Morgan, Kristen Bevlin, et al. · SPIE Photomask Technology Conference · 1
Plasma Dicing: Current State & Future Trends
2015 · Russ Westerman, Gordon Grivna, et al. · ECS Meeting Abstracts · 1
Controlled Etching of III-V Materials with Optical Emission Interferometry (OEI)
2011 · Chris Johnson, Dave Johnson, et al. · ECS Transactions · 1
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Quartz etch process to improve etch depth linearity and uniformity using Mask Etcher IV
2004 · Sunil Srinivasan, Jason Plumhoff, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Advanced pressure control in time division multiplexed (TDM) plasma etch processes
2004 · Shouliang Lai, Russ Westerman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Dry etching process in InP Gunn device technology utilizing inductively coupled plasma (ICP) system
2002 · J.Q. Liu, M.F. Zybura, et al. · Conference proceedings. ... International Conference on Indium Phosphide and Related Materials · 1
Characterization of a Manufacturable High Rate GaAs Via Etch Process
2002 · F. Clayton, Russ Westerman, et al. · 1
Works count: 38
Citation count: 269
H-index: 7
I10-index: 4
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