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Kaushik Sah
Institution:
KLA (United States)
Observed institution:
KLA (United States)
ORCID:
0000-0002-8603-4169
Observed ORCID:
0000-0002-8603-4169
OpenAlex ID:
A5032649275
EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems
2018
·
Kaushik Sah
, Andrew Cross
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
16
Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography
2020
·
Kaushik Sah
, Sandip Halder
, et al.
·
IEEE Transactions on Semiconductor Manufacturing
·
15
Process window discovery methodology development for advanced lithography
2016
·
Dieter Van den Heuvel
, Philippe Foubert
, et al.
·
ASMC proceedings
·
15
Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
2015
·
Sandip Halder
, Vincent Truffert
, et al.
·
ASMC proceedings
·
8
Single mask solution to pattern BLP and SNLP using 0.33NA EUV for next-generation DRAM manufacturing
2022
·
Kaushik Sah
, Andrew Cross
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
7
DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC
2016
·
Hari Pathangi
, Varun Vaid
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Patterning optimization for single mask bit-line-periphery and storage-node-landing-pad DRAM layers using 0.33NA EUV lithography at the resolution limit
2024
·
Van Tuong Pham
, Jeonghoon Lee
, et al.
·
Advances in Patterning Materials and Processes
·
6
Defect characterization of 28 nm pitch EUV single patterning structures for iN5 node
2021
·
Kaushik Sah
, Sayantan Das
, et al.
·
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
·
6
Process window discovery, expansion and control of design hotspots susceptible to overlay failures
2017
·
Kaushik Sah
, Andrew Cross
, et al.
·
ASMC proceedings
·
6
Resolution improvement and dose reduction in logic and memory applications from low NA to high NA
2025
·
Shubhankar Das
, Victor M. Blanco Carballo
, et al.
·
SPIE Optical and EUV Nanolithography
·
4
Advanced PnR logic patterning enabled by high-NA EUV lithography
2025
·
Syamashree Roy
, Arame Thiam
, et al.
·
SPIE Optical and EUV Nanolithography
·
4
Patterning assessment using 0.33NA EUV single mask for next generation DRAM manufacturing
2023
·
Jeonghoon Lee
, Sandip Halder
, et al.
·
DTCO and Computational Patterning
·
4
EUV based multi-patterning schemes for advanced DRAM nodes
2022
·
Sayantan Das
, Kaushik Sah
, et al.
·
Advances in Patterning Materials and Processes
·
4
EUV reticle print verification with advanced broadband optical wafer inspection and e-Beam review systems
2017
·
Ravikumar Sanapala
, Shishir Suman
, et al.
·
SPIE Photomask Technology Conference
·
4
Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection
2023
·
Eunju Kim
, Wooseok Kim
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
3
Multi-metrology: towards parametric yield predictions beyond EPE
2023
·
Franz X. Zach
, Srividya Cancheepuram
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
3
High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
2020
·
Andrew J. Cross
, Kaushik Sah
, et al.
·
3
Process window discovery methodology for extreme ultraviolet (EUV) lithography
2019
·
Sandip Halder
, Dieter Van den Heuvel
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
3
Connected component analysis of review-SEM images for sub-10nm node process verification
2017
·
Sandip Halder
, Philippe Leray
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
EPE monitoring with enhanced metrology using KLA pattern-centric solutions
2024
·
Huan Ren
, Kaushik Sah
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
2
Hotspot discovery and variability analysis for advanced EUV processes
2024
·
Kaushik Sah
, Zhijin Chen
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
2
Optical defect inspection solution for EUV stochastics detection
2020
·
Vidya Sagar Anantha
, Raghav Babulnath
, et al.
·
SPIE Conference on Extreme Ultraviolet (EUV) Lithography
·
2
Massive metrology for process development and monitoring applications
2020
·
Kaushik Sah
, Sayantan Das
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
2
Process window discovery, expansion and control of design hotspots susceptible to overlay failures
2017
·
Kaushik Sah
, Andrew Cross
, et al.
·
International Convention on Information and Communication Technology, Electronics and Microelectronics
·
2
Defectivity-aware EUV process window characterization for monolithic complementary FET HAR and 3D patterning
2025
·
Hongcheon Yang
, Min-Soo Kim
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
1
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Works count:
35
Citation count:
137
H-index:
6
I10-index:
3
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