Author

Donald J. Samuels

Observed names: D. Samuels, Donald Samuels

Observed institutions: IBM (United States), Illinois Institute of Technology, IBM Research and Development Inc. (United States)

OpenAlex ID: A5034961603

Level-specific lithography optimization for 1-Gb DRAM

2000 · A.K. Wong, R. Ferguson, et al. · IEEE Transactions on Semiconductor Manufacturing · 110

Pattern transfer at k1=0.5: get 0.25-um lithography ready for manufacturing

1996 · Wilhelm Maurer, Kimihiro Satoh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

The Application of Deep UV Phase Shifted-Single Layer Halftone Reticles to 256 Mbit Dynamic Random Access Memory Cell Patterns

1994 · Kohji Hashimoto, Donald J. Samuels, et al. · Japanese Journal of Applied Physics · 7

Electrical characterization of across-field lithographic performance for 256-Mbit DRAM technologies

1995 · Junichiro Iba, Kohji Hashimoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Challenge of 1-Gb DRAM development when using optical lithography

1997 · Timothy R. Farrell, Ronald Nunes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Optimization of resolution-enhanced photolithography for a 256 Mb DRAM cell

2002 · R. Ferguson, C. Ausschnitt, et al. · Symposium on VLSI Technology · 4

Process dependencies of optical proximity corrections

2001 · Franz X. Zach, Donald J. Samuels, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Meeting critical gate linewidth control needs at the 65 nm node

2006 · Arpan Mahorowala, Scott Halle, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Good OPC, where will this drive mask CD tolerance and mask grid size

1995 · Donald J. Samuels, Wilhelm Maurer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Masks for 0.25-μm lithography

1994 · Wilhelm Maurer, Donald J. Samuels · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Viability of conventional high-NA KrF imaging for sub-0.25-um lithography

1996 · Timothy R. Farrell, Ronald Nunes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Single-level electric testsites for phase-shifting masks

1992 · Burn J. Lin, Donald J. Samuels, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

The impact of inconsistency in assist feature generation on OPC performance

2017 · Amr Y. Abdo, Ramya Viswanathan, et al. · SPIE Photomask Technology Conference · 1

Image fidelity verification: contourIFV

2004 · Ioana Graur, Rama N. Singh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Single exposure is still alive: gate patterning at 45nm technology node

2008 · Klaus Herold, Donald J. Samuels, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Exploring the sources of MEEF in contact SRAMs

2007 · Emily Gallagher, Ian Stobert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Better on wafer performance and mask manufacturability of contacts with no or non-traditional serifs

2007 · Donald Samuels, Ian Stobert · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Characterization of across-device linewidth variation (ADLV) for 65-nm logic SRAM using CDSEM and linewidth roughness algorithms

2006 · W. Chu, C. Radens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Approach to pattern aspect ratio control

1999 · Alan C. Thomas, Franz X. Zach, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Mask challenges in high-resolution lithography

1996 · Lars W. Liebmann, William J. Adair, et al. · SPIE eBooks

Nonlinear electric field dependence of the acousto-electric gain coefficient in n-InSb

1978 · Donald Samuels, Harold Spector · Physics Letters A

Works count: 21

Citation count: 161

H-index: 5

I10-index: 2