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Hee-Wook You
Observed names:
H. W. You,
HEE-WOOK YOU,
Hee-wook You
Institution:
Kwangwoon University
Observed institutions:
Kwangwoon University,
Hanyang University
OpenAlex ID:
A5036908480
Charge trapping properties of the HfO2 layer with various thicknesses for charge trap flash memory applications
2010
·
Hee-Wook You
, Won-Ju Cho
·
Applied Physics Letters
·
158
Structural and Electrical Properties of Low Temperature Sintered Li2CO3 Doped (Ba,Sr)TiO3 Ceramics
2006
·
Hee-Wook You
, Jung-Hyuk Koh
·
Japanese Journal of Applied Physics
·
27
Low operation voltage and high thermal stability of a WSi2 nanocrystal memory device using an Al2O3/HfO2/Al2O3 tunnel layer
2012
·
Dong Uk Lee
, Hyo Jun Lee
, et al.
·
Applied Physics Letters
·
18
Nonvolatile Poly-Si TFT Charge-Trap Flash Memory With Engineered Tunnel Barrier
2011
·
Hee-Wook You
, Won-Ju Cho
·
IEEE Electron Device Letters
·
15
Thickness dependence of high-k materials on the characteristics of MAHONOS structured charge trap flash memory
2010
·
Hee-Wook You
, Se-Man Oh
, et al.
·
Thin Solid Films
·
13
Electrical properties of HfO2 charge trap flash memory with SiO2/HfO2/Al2O3 engineered tunnel layer
2009
·
Se-Man Oh
, Hee-wook You
, et al.
·
Current Applied Physics
·
10
Microstructure and dielectric properties of Li2CO3 doped 0.7(Ba,Sr)TiO3–0.3MgO ceramics
2008
·
Hee-Wook You
, Sang-Mo Koo
, et al.
·
Current Applied Physics
·
9
LOW TEMPERATURE SINTERING OF Li2CO3 ADDED (Ba,Sr)TiO3 CERAMICS
2006
·
HEE-WOOK YOU
, JUNG-HYUK KOH
·
Integrated ferroelectrics
·
9
Application of nanosphere lithography to charge trap flash memories with patterned Si3N4 trap layers
2012
·
Ho-Myoung An
, Hee-Dong Kim
, et al.
·
Microelectronic Engineering
·
5
Electrical characteristics of a ZrO2/SiO2 modified tunnel barrier for low-temperature non-volatile memory
2011
·
Hee-Wook You
, Won-Ju Cho
·
Thin Solid Films
·
5
Engineering of tunnel barrier for highly integrated nonvolatile memory applications
2011
·
Hee-Wook You
, Jung-Woo Son
, et al.
·
Applied Physics A
·
5
Electrical Characteristics of WSi2Nanocrystal Capacitors with Barrier-Engineered High-k Tunnel Layers
2011
·
Hyo Jun Lee
, Dong Uk Lee
, et al.
·
Japanese Journal of Applied Physics
·
4
Multi-layer stacked OHA and AHA tunnel barriers for charge trap flash non-volatile memory application
2011
·
Jung-Woo Son
, Hee-Wook You
, et al.
·
Current Applied Physics
·
3
Electrical properties of WSi2 nanocrystal memory with SiO2/Si3N4/SiO2 tunnel barriers
2009
·
Ki Bong Seo
, Dong Uk Lee
, et al.
·
Current Applied Physics
·
3
Simulation and Fabrication of Embedded Capacitors for Organic-based Rf System on Package Applications
2008
·
Hee-Wook You
, Jae-Yong Park
, et al.
·
Integrated ferroelectrics
·
3
Ag(Ta,Nb)O3 thin-film interdigital capacitors for microwave applications
2007
·
Hee-Wook You
, Jung-Hyuk Koh
·
Microelectronics Journal
·
3
Thermal Stability of Metal-Silicide Nanocrystal Nonvolatile Memory with Barrier Engineered Tunnel Layers
2011
·
Dong Uk Lee
, Seon Pil Kim
, et al.
·
Journal of Nanoscience and Nanotechnology
·
2
Charge loss in WSi2 nanocrystals nonvolatile memory with SiO2/Si3N4/SiO2 tunnel layer
2011
·
Dong Uk Lee
, Hyo Jun Lee
, et al.
·
Current Applied Physics
·
2
Comparative Analysis of Li2CO3Doped (Ba,Sr)TiO3and ZnBO Doped (Ba,Sr)TiO3Ceramics for the Low Temperature Sintering Applications
2009
·
Se-Ho Kim
, Hee-Wook You
, et al.
·
Ferroelectrics
·
2
Simulation and Fabrication of Embedded Capacitors in the Multilayer Printed Circuit Board
2008
·
Hee-Wook You
, Se-Ho Kim
, et al.
·
Japanese Journal of Applied Physics
·
2
Speed Enhancement of WSi2 Nanocrystal Memory with Barrier-Engineered Si3N4/HfAlO Tunnel Layer
2012
·
Dong Uk Lee
, Hyo Jun Lee
, et al.
·
Japanese Journal of Applied Physics
·
1
PDF
Nonvolatile-Memory Characteristics of SiC Nanocrystals with Variable Oxide Thickness and Crested Tunnel Barriers
2011
·
Dong Seok Han
, Dong Uk Lee
, et al.
·
Journal of Nanoscience and Nanotechnology
·
1
Electrical Characteristics of WSi2Nanocrystal Capacitors with Barrier-Engineered High-kTunnel Layers
2011
·
Hyo Jun Lee
, Dong Uk Lee
, et al.
·
Japanese Journal of Applied Physics
·
1
PDF
Electrical properties of HfO 2 charge trap flash memory with SiO 2/HfO 2/Al 2O 3 engineered tunnel layer
2010
·
Se-Man Oh
, Hee-Wook You
, et al.
·
1
THE ELECTRICAL AND STRUCTURAL PROPERTIES OF Li2CO3 DOPED 0.7(Ba,Sr)TiO3-0.3MgO CERAMICS
2007
·
HEE-WOOK YOU
, JUNG-HYUK KOH
·
Integrated ferroelectrics
·
1
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Works count:
32
Citation count:
303
H-index:
8
I10-index:
6
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