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Arno J. Bleeker

Observed names: A. Bleeker, A. J. Bleeker, A.J. Bleeker, Arno Bleeker
Institution: ASML (Netherlands)
OpenAlex ID: A5040033851
Current status of optical maskless lithography
2005 · Hans Martinsson, Tor Sandstrom, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 47
OML: optical maskless lithography for economic design prototyping and small-volume production
2004 · Tor Sandstrom, Arno Bleeker, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 32
Correction of three-fold astigmatism for ultra-high-resolution TEM
1997 · M.H.F. Overwijk, A.J. Bleeker, et al. · Ultramicroscopy · 19
Design and performance of an ultra-high-resolution 300 kV microscope
1996 · Hans Bakker, Arno Bleeker, et al. · Ultramicroscopy · 19
Experimental results of the stochastic Coulomb interaction in ion projection lithography
1999 · P. W. H. de Jager, G. Derksen, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11
The magnetic parallelizer as an optical element for Auger electrons: further characterization
1990 · Arno J. Bleeker, Pieter Kruit · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 11
Laser shockwave cleaning of EUV reticles
2007 · N. A. Lammers, A. Bleeker · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node
2003 · Ebo H. Croffie, Nick Eib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Laboratory setup for projection electron lithography and a Monte Carlo simulation of scattering mask transmission
1993 · Peter D. Miller, J. Murray Gibson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6
A condenser objective lens with asymmetric polepieces to facilitate the extraction of secondary and Auger electrons
1991 · A. J. Bleeker, P. Kruit · Review of Scientific Instruments · 6
An IntenCD map of a reticle as a feed-forward input to DoseMapper
2008 · Michael Ben Yishai, Jo Finders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Practical Correction of Three Fold Astigmatism in the Philips CM TEM
1996 · Arno J. Bleeker, Mark H.F. Overwijk, et al. · Proceedings annual meeting Electron Microscopy Society of America · 4
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
2000 · B. Volland, F. Shi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3
Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography
2000 · P.W.H. de Jager, B. Mertens, et al. · Microelectronic Engineering · 2
Design of an electron projection system with slider lenses and multiple beams
2002 · Daniel Moonen, Peter L. H. A. Leunissen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
An ultra-high-vacuum chamber for a Philips EM430 stem
1989 · A.J. Bleeker, F.J. Pijper, et al. · Ultramicroscopy · 1
Objective-lens design for high resolution ultra high vacuum EM
1992 · Arno J. Bleeker, J. Murray Gibson · Proceedings annual meeting Electron Microscopy Society of America
Optical and mechanical design for 1 nm resolution auger spectroscopy in an electron microscope
1991 · Arno J. Bleeker · Research Repository (Delft University of Technology)
Design of a UHV STEM for Through-The-Lens Electron Spectroscopy
1990 · A. J. Bleeker, P. Kruit · Proceedings annual meeting Electron Microscopy Society of America
Coincidence detection of energy loss events and secondary electrons in (S) TEM
1989 · F.J. Pijper, J.S. Faber, et al. · Ultramicroscopy
Auger spectroscopy in a Philips EM400 stem
1989 · A. Bleeker, F.J. Pijper, et al. · Ultramicroscopy
Development of Auger spectroscopy in stem, a progress report
1988 · A. Bleeker, P. Kruit · Ultramicroscopy
Works count: 22
Citation count: 184
H-index: 8
I10-index: 6
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