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Young-Hong Min
Observed name:
Young-hong Min
Institution:
ASML (Netherlands)
Observed institution:
ASML (Netherlands)
OpenAlex ID:
A5042096956
CD uniformity improvement by active scanner corrections
2002
·
Jan B. van Schoot
, Oscar Noordman
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
22
The improvement of DOF for sub-100nm process by focus scan
2006
·
Jung-Chan Kim
, Hyun-Jo Yang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Aberration sensitivity control for the isolation layer in low-k1 DRAM process
2002
·
Byeong-Ho Cho
, Donggyu Yim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Overlay metrology for low-k1: challenges and solutions
2012
·
Jens T. Neumann
, Jongsu Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
High NA polarized light lithography for 0.29k1 process
2006
·
Chanha Park
, Jeonkyu Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Effective alignment techniques and their implementation to enhance total overlay accuracy on highly reflective films
1995
·
Young-Hong Min
, Seung-Chan Moon
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Analysis of the impact of pupil shape variation by pupil fit modeling
2010
·
Jin-hyuck Jeon
, Chan-ha Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Lithography performance and simulation accuracy at different polarization states for sub 40nm node
2008
·
Ki-Yeop Park
, Ho-young Kang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Overlay metrology for low-k 1 : Challenges and solutions
2012
·
Neumann Jens Timo
, Lee Jong-Su
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
低k 1 のための重ね合わせメトロロジ:挑戦とソリューション
2012
·
Neumann Jens Timo
, Lee Jongsu
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
The analysis of polarization characteristics on 40nm memory devices
2009
·
Minae Yoo
, Chanha Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Characteristics analysis of polarization module on optical proximity effect
2007
·
Chanha Park
, Jongkyun Hong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
How to obtain accurate resist simulations in very low-k1 era?
2006
·
Tsann-Bim Chiou
, Chan-Ha Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
13
Citation count:
44
H-index:
3
I10-index:
1
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