Author

Michael Hornung

Observed name: M. Hornung

Institution: SUSS MicroTec (Germany)

Observed institution: SUSS MicroTec (Germany)

OpenAlex ID: A5042628416

UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing

2009 · Ran Ji, Michael Hornung, et al. · Microelectronic Engineering · 147

Advanced mask aligner lithography: new illumination system

2010 · Reinhard Voelkel, Uwe Vogler, et al. · Optics Express · 93

Full wafer microlens replication by UV imprint lithography

2009 · H. Schmitt, M. Rommel, et al. · Microelectronic Engineering · 38

High resolution 3D NanoImprint technology: Template fabrication, application in Fabry–Pérot-filter-array-based optical nanospectrometers

2013 · Xiaolin Wang, Alla Albrecht, et al. · Microelectronic Engineering · 32

Novel organic polymer for UV-enhanced substrate conformal imprint lithography

2012 · R. Fader, H. Schmitt, et al. · Microelectronic Engineering · 19

Contact and proximity lithography using 193nm Excimer laser in Mask Aligner

2009 · S. Partel, S. Zoppel, et al. · Microelectronic Engineering · 19

Advanced mask aligner lithography (AMALITH)

2012 · Reinhard Voelkel, Uwe Vogler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Mask aligner lithography simulation – From lithography simulation to process validation

2012 · K. Motzek, S. Partel, et al. · Microelectronic Engineering · 13

Optimization of illumination pupils and mask structures for proximity printing

2009 · K. Motzek, A. Bich, et al. · Microelectronic Engineering · 11

Computational algorithms for optimizing mask layouts in proximity printing

2010 · K. Motzek, U. Vogler, et al. · Microelectronic Engineering · 10

6 inch full field wafer size nanoimprint lithography for photonic crystals patterning

2010 · Michael Hornung, Ran Ji, et al. · IEEE International Conference on Nanotechnology (IEEE-NANO) · 8

Full Field Nanoimprint on Mask Aligners Using Substrate Conformal Imprint Lithography Technique

2009 · Ran Ji, A. Krüger, et al. · Acta Physica Polonica A · 8

Simulation tools for advanced mask aligner lithography

2011 · Arianna Bramati, Uwe Vogler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Application of an Angular Exposure System to fabricate true-chip-size packages for SAW devices

2011 · Barbara L'huillier, Michael Hornung, et al. · European Microelectronics and Packaging Conference · 6

Customized illumination for process window optimization and yield improvement in mask aligner lithography systems

2010 · Michael Hornung, Uwe Vogler, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 6

Mask aligner process enhancement by spatial filtering

2011 · Uwe Vogler, Andreas Bich, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Lithography for Wafer Level Packaging for LED Manufacturing

2013 · Michael Hornung · Additional Conferences (Device Packaging HiTEC HiTEN & CICMT)

Using computational methods for mask aligner lithography

2012 · Kristian Motzek, Andreas Erdmann, et al. · SPIE Newsroom

Works count: 19

Citation count: 436

H-index: 10

I10-index: 10