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Kenji Ohtoshi

Investigation of recycling in the GAMMA 10 tandem mirror
1992 · Y. Nakashima, K. Yatsu, et al. · Journal of Nuclear Materials · 36
EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
2014 · Hidekazu Takekoshi, Takahito Nakayama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Multibeam mask writer MBM-1000
2018 · Hiroshi Matsumoto, Hideo Inoue, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 14
Advanced electron-beam writing system EX-11 for next-generation mask fabrication
1999 · Toru Tojo, Ryoji Yoshikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
2014 · Hidekazu Takekoshi, Takahito Nakayama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond
2011 · Shusuke Yoshitake, Takashi Kamikubo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
EBM-5000: electron-beam mask writer for 45-nm node
2006 · Hitoshi Sunaoshi, Yuichi Tachikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Electron beam mask writer EBM-7000 for hp 32nm generation
2009 · Takashi Kamikubo, Kenji Ohtoshi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Electron-beam mask writer EBM-6000 for 45 nm HP node
2007 · Jun Yashima, Kenji Ohtoshi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Multi-beam mask writer MBM-1000
2017 · Hiroshi Matsumoto, Hiroshi Yamashita, et al. · 8
Evaluation of the background signal for mass spectrometry under high ambient hydrogen pressures in plasma discharges
1995 · Y. Nakashima, K. Tsuchiya, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 8
Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process
1995 · Munehiro Ogasawara, Kenji Ohtoshi, et al. · Japanese Journal of Applied Physics · 6
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Multi-beam mask writer MBM-1000
2018 · Hiroshi Matsumoto, Hiroshi Yamashita, et al. · Photomask and next-generation lithography mask technology. Conference · 4
New electron optics for mask writer EBM-7000 to challenge hp 32nm generation
2008 · Takashi Kamikubo, Steven Golladay, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
In-situ beam metrology in shaped-beam lithography tool
2008 · Takashi Kamikubo, Kenji Ohtoshi, et al. · Physics Procedia · 3
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Analysis of wall conditioning by using plasma impact desorption in the tandem mirror GAMMA 10
1993 · Y. Nakashima, K. Yatsu, et al. · Journal of Nuclear Materials · 3
Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers
2021 · Haruyuki Nomura, Noriaki Nakayamada, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2
Electron beam mask writer EBM-8000P for high throughput mask production
2020 · Tomohiro Iijima, Satoshi Nakahashi, et al. · SPIE Novel Patterning Technologies · 2
Multi-beam mask writer MBM-1000
2018 · Hiroshi Matsumoto, Takao Tamura, et al. · SPIE Novel Patterning Technologies · 1
Multi-beam mask writer MBM-1000
2017 · Hiroshi Yamashita, Takao Tamura, et al. · European Mask and Lithography Conference (EMLC) · 1
Writing accuracy of EBM-3500 electron-beam mask writing system
2001 · Kenji Ohtoshi, Hitoshi Sunaoshi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System
1997 · Naoharu Shimomura Naoharu Shimomura, Munehiro Ogasawara Munehiro Ogasawara, et al. · Japanese Journal of Applied Physics · 1
Development of an in-situ cleaning system for an e-beam reticle writer
1997 · Kenji Ohtoshi, Satoshi Yamasaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Works count: 23
Citation count: 171
H-index: 9
I10-index: 7
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