Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
Cheolhong Park
Observed name:
Park, Cheolhong
Institutions:
Samsung (South Korea),
Samsung Electronics (South Korea),
Ulsan Metropolitan City,
Ulsan National Institute of Science and Technology
Observed institutions:
Samsung (South Korea),
Samsung Electronics (South Korea),
Ulsan Metropolitan City,
Ulsan National Institute of Science and Technology
ORCID:
0000-0001-8992-6317
Observed ORCID:
0000-0001-8992-6317
OpenAlex ID:
A5046203218
Photosensitive ion channels in layered MXene membranes modified with plasmonic gold nanostars and cellulose nanofibers
2023
·
Jeonghee Yeom
, Ayoung Choe
, et al.
·
Nature Communications
·
110
PDF
Multi‐Layered Triboelectric Nanogenerators with Controllable Multiple Spikes for Low‐Power Artificial Synaptic Devices
2023
·
Yong‐Jin Park
, Yun Goo Ro
, et al.
·
Advanced Science
·
44
PDF
Shape‐Reconfigurable Crack‐Based Strain Sensor with Ultrahigh and Tunable Sensitivity
2025
·
Seungjae Lee
, Youngoh Lee
, et al.
·
Advanced Functional Materials
·
36
PDF
Ionic–Bionic Interfaces: Advancing Iontronic Strategies for Bioelectronic Sensing and Therapy
2025
·
Yun Goo Ro
, Yoojin Chang
, et al.
·
Advanced Science
·
21
Stretchable skin hydration sensor based on hygroscopic and ion conductive polymer composites
2022
·
Sangyun Na
, Jeonghee Yeom
, et al.
·
Chemical Engineering Journal
·
20
Reservoir computing determined by nonlinear weight dynamics in Gd-doped CeO 2 /CeO 2 bi-layered oxide memristors
2025
·
Sola Moon
, Cheolhong Park
, et al.
·
Journal of Materials Chemistry C
·
12
Robust biodegradable synapse with sub-biological energy and extended memory for intelligent reflexive system
2025
·
Yoojin Chang
, Sangyun Na
, et al.
·
Nature Communications
·
7
PDF
A Bioinspired Ionic Heterojunction Generator Enabling Stimulus‐Free, Scalable Energy Harvesting
2025
·
Seungjae Lee
, Youngoh Lee
, et al.
·
Advanced Energy Materials
·
3
Structure–property relationships in molecular antimony photoresists for extreme ultraviolet lithography
2026
·
Khuslen Bazarragchaa
, Yubin Choi
, et al.
·
Chemical Engineering Journal
Recessing material and process for improving contact hole patterns for high-NA and hyper-NA EUV lithography
2026
·
Jeongsik Kim
, Jinmo Kim
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
Confinement‐Induced Donnan Potential Enables Sealed Hydrovoltaic Power From Microliter Water
2026
·
Sangyun Na
, Geonyoung Jung
, et al.
·
Advanced Materials
Energy-efficient and application-specific neuromorphic computing via oxygen vacancy migration engineering in multi-layered memristors
2026
·
Sola Moon
, Seongwook Chae
, et al.
·
Nano Energy
The trade-off between local critical dimension uniformity and sensitivity for contact hole high-NA printing in chemically amplified resists
2022
·
Chawon Koh
, Jinkyu Han
, et al.
·
International Conference on Extreme Ultraviolet Lithography
Show more works
View as search
Works count:
14
Citation count:
254
H-index:
7
I10-index:
6
Year
Topic
Type