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Hiroyuki Fukumizu
Observed names:
Fukumizu Hiroyuki,
Fukumizu, Hiroyuki,
H. Fukumizu,
Hiroyuki Fukumizu Hiroyuki Fukumizu
Institution:
KIOXIA Corporation (Japan)
Observed institutions:
Toshiba (Japan),
Kyoto University,
KIOXIA Corporation (Japan),
Center for Low-temperature Plasma Sciences, Nagoya University,
Nagoya University,
Stanford University
show all 6
ORCID:
0009-0006-9077-8538
Observed ORCID:
0009-0006-9077-8538
OpenAlex ID:
A5049767012
Atomic layer etching of AlGaN using Cl2 and Ar gas chemistry and UV damage evaluation
2019
·
Hiroyuki Fukumizu
, Makoto Sekine
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
37
Initial growth analysis of ALD Al 2 O 3 film on hydrogen-terminated Si substrate via in situ XPS
2019
·
Hiroyuki Fukumizu
, Makoto Sekine
, et al.
·
Japanese Journal of Applied Physics
·
16
High aspect ratio SiO2/SiN (ON) stacked layer etching using C3HF5, C4H2F6, and C4H4F6
2024
·
C. Abe
, T. Sasaki
, et al.
·
Japanese Journal of Applied Physics
·
14
Analysis of formation mechanism of deposited film in a high-aspect-ratio hole during dry etching using fluorocarbon gas plasmas
2022
·
Noboru Hiwasa
, Junji Kataoka
, et al.
·
Applied Physics Express
·
14
PDF
Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma
2021
·
Keita Ichikawa
, Manh Hung Chu
, et al.
·
Applied Physics Express
·
14
PDF
Tunneling barrier height at defect sites on Si(001)
1999
·
Hiroyuki Fukumizu
, Shu Kurokawa
, et al.
·
Surface Science
·
14
Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma
2020
·
Makoto Moriyama
, Naoya Nakahara
, et al.
·
Japanese Journal of Applied Physics
·
12
PDF
Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma
2020
·
Makoto Moriyama
, Naoya Nakahara
, et al.
·
Japanese Journal of Applied Physics
·
9
PDF
Atomic Layer Deposition of Perpendicularly Magnetized Co Layers Showing Current-Induced Domain Wall Motion
2023
·
Masaki Kado
, Yoshinori Tokuda
, et al.
·
IEEE Transactions on Magnetics
·
7
Barrier-Height Imaging of Si(001) 2 × n
1998
·
Hiroyuki Fukumizu Hiroyuki Fukumizu
, Shu Kurokawa Shu Kurokawa
, et al.
·
Japanese Journal of Applied Physics
·
6
Angular distribution measurement of high-energy ions and neutrals impinging on an RF electrode in a dual-frequency capacitively-coupled Ar plasma
2025
·
Shunya Kawamura
, Dohan Kim
, et al.
·
Plasma Sources Science and Technology
·
5
Influence of bias voltage on the Ar/CH 2 F 2 /O 2 plasma etching of Si 3 N 4 films
2024
·
Shuichi Kuboi
, Junji Kataoka
, et al.
·
Japanese Journal of Applied Physics
·
5
In situ analysis of SiO2 films etched under cryogenic conditions using H2/F2/Ar gas mixture plasma
2026
·
Yuma Kato
, Junji Kataoka
, et al.
·
Applied Physics Letters
·
4
Influence of sheath collisions on the ion angular distributions in a dual-frequency capacitively coupled plasma
2025
·
Dohan Kim
, Shunya Kawamura
, et al.
·
Japanese Journal of Applied Physics
·
3
Measurement of energy-resolved ion angular distribution in a dual-frequency capacitively coupled argon plasma
2025
·
Dohan Kim
, Shunya Kawamura
, et al.
·
Japanese Journal of Applied Physics
·
3
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma
2025
·
Junji Kataoka
, Norikatsu Sasao
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
2
Reactive ion etching process of SiO 2 film using on-site synthesized C 2 F 4 from CF 4
2021
·
Daiki Iino
, Satoshi Tanida
, et al.
·
Japanese Journal of Applied Physics
·
2
PDF
On-site tetrafluoroethylene gas generation from moderate-pressure pure tetrafluoromethane plasma reactor
2020
·
Hiromasa Ohmi
, Jou Kikura
, et al.
·
Chemical Engineering Science
·
2
Investigation of surface reactions of etched SiN films using HF/PF3 gas mixture plasma under cryogenic conditions via in-line XPS: The role of ammonium salts in etch rate enhancement
2026
·
Junji Kataoka
, Yuma Kato
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
1
Comparative study of deposition characteristics a-C:H films by plasma CVD using methane, acetylene, and cumene
2025
·
Shinjiro Ono
, Takamasa Okumura
, et al.
·
Diamond and Related Materials
·
1
Atomic Layer Deposition of Perpendicularly Magnetized Co Layers Showing Current-induced Domain Wall Motion
2023
·
Masaki Kado
, Yoshinori Tokuda
, et al.
·
IEEE International Magnetic Conference - Short Papers (INTERMAG Short Papers)
·
1
In-situ analysis of SiO2 films etched under cryogenic conditions using H2/F2/Ar gas mixture plasma
2026
·
Kurihara, Kazuaki
, Iino, Daiki
, et al.
·
AIP Publishing
Supplement Number 1
2026
·
Kato, Yuma
, kataoka, junji
, et al.
·
AIP Publishing
On-site C 2 F 4 generation from CF 4 feedstock gas using moderate-pressure plasma
2020
·
Rei Tanaka
, Tomoyuki Tanaka
, et al.
·
The Japan Society of Applied Physics
Study on separation and concentration techniques for C 2 F 4 gas synthesized by pure CF 4 plasma
2020
·
Hiromasa Ohmi
, Rei Tanaka
, et al.
·
The Japan Society of Applied Physics
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Works count:
27
Citation count:
172
H-index:
8
I10-index:
7
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