Author

Jun Sung Chun

Observed names: JUN CHUN, Jun Chun

Institutions: State University of New York, University at Albany, State University of New York, SUNY Polytechnic Institute

Observed institutions: State University of New York, University at Albany, State University of New York, SK Hynix (South Korea), Hanyang University, SUNY Polytechnic Institute

OpenAlex ID: A5059379711

Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism

2015 · Jing Jiang, Ben Zhang, et al. · Journal of Photopolymer Science and Technology · 28

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Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

2016 · Dhairya Dixit, Avery Green, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 21

New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography

2015 · Christopher Ober, Jing Jiang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Methods of controlling cross-linking in negative-tone resists

2014 · Richard A. Lawson, Jun Sung Chun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement

2014 · Jun Sung Chun, Shih-Hui Jen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists

2015 · Hannah Narcross, Richard A. Lawson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists

2015 · Jing Jiang, Mufei Yu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

The patterning center of excellence (CoE): an evolving lithographic enablement model

2015 · Warren Montgomery, Jun Sung Chun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Optimizing performance in cross-linking negative-tone molecular resists

2015 · Richard A. Lawson, Hannah Narcross, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Base developable negative tone molecular resist based on epoxide cross-linking

2015 · Brandon Sharp, Richard A. Lawson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Benchmarking study of EUV resists for NXE:3300B

2016 · Yu-Jen Fan, Mac Mellish, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality

2015 · Cecilia Montgomery, Jun Sung Chun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

EUV Research Activity at SEMATECH

2014 · Mark Neisser, Shih-Hui Jen, et al. · Journal of Photopolymer Science and Technology · 5

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Understanding EUV resist mottling leading to better resolution and linewidth roughness

2014 · James Thackeray, James Cameron, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Positive tone cross-linked resists based on photoacid inhibition of cross linking

2014 · Richard A. Lawson, Jun Sung Chun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

First results of outgas resist family test and correlation between outgas specifications and EUV resist development

2015 · Yu-Jen Fan, Ken Maruyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

The factors affecting improvement sensitivity, CDU, and resolution in EUV resist

2014 · Joonhee Han, Hyun Soon Lim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Self-aligned resist patterning with 172nm and 193nm backside flood exposure on attenuated phase shift masks

2007 · Jun Chun, Taejoong Ha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

High χ block copolymers based on chemical modification of poly(t-butyl acrylate) containing block copolymers

2016 · Sungmin Park, Seongjun Jo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Studying the mechanism of hybrid nanoparticle EUV photoresists

2015 · Ben Zhang, Li Li, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Optical CD metrology for directed self-assembly assisted contact hole shrink process

2015 · Dhairya Dixit, Erik R. Hosler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

IMMOBILIZATION AND CHARACTERIZATION OF AN ARTIFICIALLY ASSEMBLED TRI-STRAND β-SHEET STRUCTURE ON A RIGID Au (111) SURFACE

2006 · WONBAE LEE, JUN CHUN, et al. · International Journal of Nanoscience

Works count: 22

Citation count: 152

H-index: 7

I10-index: 4