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Donghwan Son
Observed names:
D. H. Son,
D.H. Son,
DongHwan Son
Institution:
KLA (United States)
Observed institutions:
ASML (United States),
KLA (United States)
OpenAlex ID:
A5061766707
Hotspot fixing using ILT
2011
·
Woojoo Sim
, Sunggon Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
17
Enhancing fullchip ILT mask synthesis capability for IC manufacturability
2011
·
Thomas Cecil
, Chris Ashton
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
15
Application of Dosemapper for 65-nm gate CD control: strategies and results
2006
·
Nazneen Jeewakhan
, Nader Shamma
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection
2023
·
Eunju Kim
, Wooseok Kim
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
3
Wafer printability simulation of EUV mask defects using mask SEM and AFM
2024
·
Donghwan Son
, Lanpo He
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
2
Computational techniques for determining printability of real defects in EUV mask pilot line
2014
·
Paul Morgan
, Daniel Rost
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Improving model prediction accuracy for ILT with aggressive SRAFs
2010
·
Sunggon Jung
, Woojoo Sim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Evaluation of AIMS D2DB simulation without calibration images
2014
·
Masaharu Nishiguchi
, Kouichi Kanno
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Lithography aware design optimization using ILT
2011
·
Jaeyoon Jeong
, Seokyun Jeong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Overcome the process limitation by using inverse lithography technology with assist feature
2011
·
Yeon-Ah Shim
, Sungho Jun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Improvement of KrF contact layer by inverse lithography technology with assist feature
2010
·
Sungho Jun
, Yeon-Ah Shim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Patterning of 90nm node flash contact hole with assist feature using KrF
2009
·
Yeonah Shim
, Sungho Jun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Improvements of AIMS D2DB matching for product patterns
2015
·
Masaharu Nishiguchi
, Koichi Kanno
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
13
Citation count:
60
H-index:
3
I10-index:
3
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