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Luoqi Chen
Observed name:
Chen, Luoqi
Institution:
South China Normal University
Observed institutions:
Queen's University Belfast,
South China Normal University,
ASML (United States)
OpenAlex ID:
A5062273470
An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging
2008
·
Stephen Hsu
, Luoqi Chen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
50
Fast and accurate 3D mask model for full-chip OPC and verification
2007
·
Peng Liu
, Yu Cao
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
49
Development of layout split algorithms and printability evaluation for double patterning technology
2008
·
Tsann-Bim Chiou
, Robert Socha
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
37
Optimized hardware and software for fast full-chip simulation
2005
·
Yu Cao
, Yen-Wen Lu
, et al.
·
Optical Microlithography XVIII
·
25
Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance
2009
·
Stephen Hsu
, Zhipan Li
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
24
Full-chip source and mask optimization
2011
·
Min-Chun Tsai
, Stephen Hsu
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
18
SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance
2010
·
Seiji Nagahara
, Kazuyuki Yoshimochi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies
2008
·
Tsann-Bim Chiou
, Robert Socha
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
SLM device for 193 nm lithographic applications
2008
·
John Lauria
, Ronald Albright
, et al.
·
Microelectronic Engineering
·
12
Design compliant source mask optimization (SMO)
2010
·
Robert Socha
, Tejas Jhaveri
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Predictive focus exposure modeling (FEM) for full-chip lithography
2006
·
Luoqi Chen
, Yu Cao
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Accurate models for EUV lithography
2009
·
Eric Hendrickx
, Gian F. Lorusso
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Ultra Buck DC/DC Converter for Electric Vehicles
2020
·
Chen, Luoqi
, Elkhateb, Ahmad
, et al.
·
arXiv (Cornell University)
·
4
PDF
Using FlexRay in Computational Lithography
2011
·
Robert Socha
, Wenjin Shao
, et al.
·
Japanese Journal of Applied Physics
·
2
PDF
SIMD Optimizations of White-Box Block Cipher Implementations with the Self-equivalence Framework
2025
·
Luoqi Chen
, Yufeng Tang
, et al.
·
Lecture notes in computer science
·
1
Differential Fault Analysis Against White-Box SM4 Implementations
2025
·
Liangju Zhao
, Luoqi Chen
, et al.
·
Lecture notes in computer science
Implicit White-Box Implementations of Efficient Double-Block-Length MAC
2025
·
Hengxing Liu
, Yupeng Zhang
, et al.
·
Communications in computer and information science
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Works count:
17
Citation count:
274
H-index:
10
I10-index:
11
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