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Robert de Kruif
Observed names:
R. de Kruif,
Robert C. de Kruif
Institution:
ASML (Netherlands)
Observed institutions:
Philips (Netherlands),
ASML (Netherlands)
OpenAlex ID:
A5069137826
Progress on EUV pellicle development
2014
·
Carmen Zoldesi
, Kursat Bal
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
89
High-power EUV lithography: spectral purity and imaging performance
2020
·
Mark A. van de Kerkhof
, Fei Liu
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
37
PDF
Experimental approach to EUV imaging enhancement by mask absorber height optimization
2013
·
Natalia Davydova
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
27
Impact of an etched EUV mask black border on imaging and overlay
2012
·
Natalia Davydova
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
18
Mask aspects of EUVL imaging at 27nm node and below
2011
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
16
Impact of an etched EUV mask black border on imaging: part II
2013
·
Natalia Davydova
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
Heterojunction bipolar transistors with Si1−xGex base
1992
·
A. Pruijmboom
, C.E. Timmering
, et al.
·
Microelectronic Engineering
·
13
EUV mask stack optimization for enhanced imaging performance
2010
·
Eelco van Setten
, Dorothe Oorschot
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Mask characterization for double patterning lithography
2009
·
Karsten Bubke
, Robert de Kruif
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
11
Spectral purity performance of high-power EUV systems
2020
·
Mark A. van de Kerkhof
, Fei Liu
, et al.
·
SPIE Conference on Extreme Ultraviolet (EUV) Lithography
·
10
PDF
Alternative EUV mask technology to compensate for mask 3D effects
2015
·
Lieve Van Look
, Vicky Philipsen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Imaging performance improvements by EUV mask stack optimization
2011
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Wafer based mask characterization for double patterning lithography
2008
·
Robert de Kruif
, Karsten Bubke
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond
2014
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Achievements and challenges of EUV mask imaging
2014
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
2015
·
N. Davydova
, R. Kottumakulal
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
EUV phase shift mask requirements for imaging at low-k1
2020
·
Frank J. Timmermans
, Claire van Lare
, et al.
·
SPIE Photomask Technology Conference
·
4
EUVL mask performance and optimization
2012
·
Natalia Davydova
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Reduced pellicle impact on overlay using high order intrafield grid corrections
2009
·
Robert de Kruif
, Tasja van Rhee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Experimental validation of novel EUV mask technology to reduce mask 3D effects
2015
·
Lieve Van Look
, Vicky Philipsen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Mask characterization for double patterning lithography
2007
·
Karsten Bubke
, Eric Cotte
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Experimental validation of novel mask technology to reduce mask 3D effects
2015
·
Lieve Van Look
, Vicky Philipsen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Reticle processing induced proximity effects
2002
·
Maurice Janssen
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Investigation of anamorphic reductions in hyper-NA EUV
2026
·
Lin Han
, Gerardo Bottiglieri
, et al.
·
European Mask and Lithography Conference (EMLC)
Mask inspection placement maps for improving overlay
2009
·
Ziv Parizat
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
26
Citation count:
320
H-index:
10
I10-index:
13
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