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Ismail Emesh

Observed names: I Emesh, I. Emesh, I. T. Ali Emesh, I. T. EMESH, I.T. A. Emesh, Ismail T. A. Emesh, Ismail T. Emesh
OpenAlex ID: A5072325091
Oxidative coupling of methane over the oxides of Group IIIA, IVA, and VA metals
1986 · I. T. Ali Emesh, Y. Amenomiya · The Journal of Physical Chemistry · 102
Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers
2001 · Y.-M Sun, S.Y Lee, et al. · Thin Solid Films · 56
A sub-micron BiCMOS technology for telecommunications
1991 · R. Hadaway, P. Kempf, et al. · Microelectronic Engineering · 46
Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetraethylorthosilicate (TEOS)
1989 · Ismail T. Emesh, Giulio D'Asti, et al. · Journal of The Electrochemical Society · 44
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Dielectric properties of ferroelectric thin films in the frequency range of mHz-GHz
1995 · V. Chivukula, J. Ilowski, et al. · Integrated ferroelectrics · 29
Growth, selectivity and adhesion of CVD-deposited copper from Cu+1 (hexafluoroacetylacetonate trimethylvinylsilane) and dichlorodimethylsilane
1995 · James B. Webb, Daniel Northcott, et al. · Thin Solid Films · 17
Surface chemistry and fundamental limitations on the plasma cleaning of metals
2016 · Bin Dong, M. Sky Driver, et al. · Applied Surface Science · 14
Optimized integrated copper gap-fill approaches for 2x flash devices
2009 · Paul Ma, Qian Luo, et al. · IEEE International Interconnect Technology Conference (IITC) · 14
Electrochemical Mechanical Planarization (eCMP) of Copper Thin Films
2007 · Serdar Aksu, Ismail Emesh, et al. · ECS Transactions · 7
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TEOS-Based Oxides: Deposition Dependent Properties
1993 · M. Saran, I. Emesh · Materials science forum · 4
Characterization of silicon oxide films deposited using tetraethylorthosilicate
1989 · M. Simard Normandin, I. Emesh, et al. · Canadian Journal of Physics · 4
Thickness measurement for Cu and Ta thin films using optoacoustics
2002 · M. Gostein, T.C. Bailey, et al. · IEEE International Interconnect Technology Conference (IITC) · 3
Adsorption and 13C N.m.r. studies of ethene, ethane and carbon monoxide on zn‐ and cd‐exchanged A‐zeolites
1985 · Ismail T. A. Emesh, Ian D. Gay · Journal of Chemical Technology and Biotechnology Chemical Technology · 3
Investigation Of Photoablation As A Patterning Technique For Silicon Based Integrated Circuits: Laser Ablation And Physical Damage Threshold Considerations
1990 · D. L. Singleton, G. Paraskevopoulos, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Electrochemical Mechanical Planarization (eCMP) of Copper Thin Films
2006 · Serdar Aksu, Ismail Emesh, et al. · ECS Meeting Abstracts
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ChemInform Abstract: Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetraethylorthosilicate (TEOS).
1990 · I. T. EMESH, G. D'ASTI, et al. · ChemInform
Works count: 16
Citation count: 345
H-index: 8
I10-index: 8
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