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Andrei M. Yakunin

Observed names: A M Yakunin, A Yakunin, A. M. Yakunin, A.M Yakunin, A.M. Yakunin, Andrei Yakunin, Yakunin, A. M., Yakunin, A.M., Yakunin, AM (Andrei), Yakunin, Andrei M.
Institution: ASML (Netherlands)
ORCID: 0009-0001-9270-7067
Observed ORCID: 0009-0001-9270-7067
OpenAlex ID: A5108084520
Spatial Structure of an Individual Mn Acceptor in GaAs
2004 · A. M. Yakunin, A. Yu. Silov, et al. · Physical Review Letters · 193
Warping a single Mn acceptor wavefunction by straining the GaAs host
2007 · A. M. Yakunin, A. Yu. Silov, et al. · Nature Materials · 69
Short period La/B and LaN/B multilayer mirrors for ~68 nm wavelength
2013 · Igor A. Makhotkin, Erwin Zoethout, et al. · Optics Express · 67
EUV-induced hydrogen plasma and particle release
2022 · Mark van de Kerkhof, Andrei M. Yakunin, et al. · Radiation effects and defects in solids · 44
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Free-standing spectral purity filters for extreme ultraviolet lithography
2012 · Nikolay I. Chkhalo, Mikhail N. Drozdov, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 44
Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge
2012 · Igor A. Makhotkin, Erwin Zoethout, et al. · Optics Express · 40
Spatial Structure of Mn-Mn Acceptor Pairs in GaAs
2005 · A. M. Yakunin, A. Yu. Silov, et al. · Physical Review Letters · 40
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Advanced particle contamination control in EUV scanners
2019 · Mark A. van de Kerkhof, Tjarko van Empel, et al. · Extreme Ultraviolet (EUV) Lithography · 34
Surface Induced Asymmetry of Acceptor Wave Functions
2010 · C. Çelebi, J. K. Garleff, et al. · Physical Review Letters · 34
EUV-induced hydrogen plasma: pulsed mode operation and confinement in scanner
2021 · Mark A. van de Kerkhof, Andrei M. Yakunin, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 33
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Understanding EUV-induced plasma and application to particle contamination control in EUV scanners
2020 · Mark A. van de Kerkhof, Andrei Yakunin, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 28
Magnetization reversal process and nonlinear magneto-impedance in Cu/NiFe and Nb/NiFe composite wires
2002 · A.S Antonov, N.A Buznikov, et al. · Journal of Magnetism and Magnetic Materials · 27
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Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources
2009 · Wouter A. Soer, Martin J. J. Jak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26
Plasma-assisted discharges and charging in EUV-induced plasma
2021 · Mark van de Kerkhof, Andrei M. Yakunin, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 23
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Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors
2012 · V. V. Medvedev, A. E. Yakshin, et al. · Optics Letters · 19
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Charging and Mobilization of Dust Particles on a Surface in Plasma
2024 · José H. Pagán Muñoz, Xu Wang, et al. · Physical Review Letters · 18
Propulsion of a flat tin target with pulsed CO 2 laser radiation: measurements using a ballistic pendulum
2017 · B V Lakatosh, D B Abramenko, et al. · Laser Physics Letters · 18
Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet
2012 · Igor A. Makhotkin, Erwin Zoethout, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 17
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Determination of closure domain penetration in electrodeposited microtubes by combined magnetic force microscopy and giant magneto-impedance techniques
2001 · J. M. Garcia, A. Asenjo, et al. · Journal of Applied Physics · 17
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Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam
2020 · P V Krainov, V V Ivanov, et al. · Plasma Sources Science and Technology · 15
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Infrared suppression by hybrid EUV multilayer—IR etalon structures
2011 · V. V. Medvedev, A. E. Yakshin, et al. · Optics Letters · 15
Domain-walls motion in glass-coated CoFeSiB amorphous microwires
2002 · A.S. Antonov, N.A. Buznikov, et al. · Journal of Magnetism and Magnetic Materials · 15
Particulate and molecular contamination control in EUV-induced H2-plasma in EUV lithographic scanner
2020 · Mark A. van de Kerkhof, Ernst Galutschek, et al. · Space Systems Contamination: Prediction, Control, and Performance · 14
Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
2013 · V. V. Medvedev, R. W. E. van de Kruijs, et al. · Applied Physics Letters · 14
Imaging of the (Mn2+3d5 + hole) complex in GaAs by cross-sectional scanning tunneling microscopy
2004 · A.M Yakunin, A.Yu Silov, et al. · Physica E Low-dimensional Systems and Nanostructures · 13
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Works count: 57
Citation count: 946
H-index: 17
I10-index: 25
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