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Ryuji Ohnishi

Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation
2011 · Takahiro Kozawa, Seiichi Tagawa, et al. · Japanese Journal of Applied Physics · 19
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Dual Grating Interferometric Lithography for 22-nm Node
2008 · Hideaki Shiotani, Shota Suzuki, et al. · Japanese Journal of Applied Physics · 18
Pattern Replication in EUV Interference Lithography
2008 · Shota Suzuki, Yasuyuki Fukushima, et al. · Journal of Photopolymer Science and Technology · 10
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Mitigation of Low LER with PAG Bonded Resist for EUVL
2007 · Yasuyuki Fukushima, Takeo Watanabe, et al. · Journal of Photopolymer Science and Technology · 10
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Development of under layer material for EUV lithography
2011 · Rikimaru Sakamoto, Bang-Ching Ho, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist
2009 · Ryuji Ohnishi, Takeo Watanabe, et al. · Japanese Journal of Applied Physics · 8
Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist
2008 · Yasuyuki Fukushima, Takeo Watanabe, et al. · Japanese Journal of Applied Physics · 8
Development of Under Layer Material for EUV Lithography
2011 · Rikimaru Sakamoto, Bang-Ching Ho, et al. · ECS Transactions · 6
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PAG Study of PAG Bonded Resist for EUV and EB Lithography
2008 · Yasuyuki Fukushima, Takeo Watanab, et al. · Journal of Photopolymer Science and Technology · 6
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Development of Low Line Edge Roughness and Highly Sensitive Resist for Extreme Ultraviolet Lithography
2007 · Yasuyuki Fukushima, Takeo Watanabe, et al. · Japanese Journal of Applied Physics · 6
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Extreme Ultraviolet Resist Development at the University of Hyogo
2007 · Takeo Watanabe, Yasuyuki Fukushima, et al. · Japanese Journal of Applied Physics · 4
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Dual grating interferometric lithography for 22-nm node
2007 · Hideaki Shiotani, Shota Suzuki, et al. · International Microprocesses and Nanotechnology Conference (MNC) · 1
Optimization of photo acid generator in the PAG-bonded resist
2007 · Yasuyuki Fukkushima, Hiroo Kinoshita, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Works count: 13
Citation count: 104
H-index: 7
I10-index: 4
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