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Author

Tamio Yamazaki

Observed names: TAMIO YAMAZAKI, Yamazaki, Tamio
Observed institutions: NEC (Japan), Canon (Japan), Kyoto University, JSR (Japan), Semiconductor Leading Edge Technologies, Inc (Japan), The University of Tokyo
ORCID: 0009-0007-6673-9608
Observed ORCID: 0009-0007-6673-9608
OpenAlex ID: A5111683460
Oxygenative Cleavage of Chlorocatechols with Molecular Oxygen Catalyzed by Non-Heme Iron(III) Complexes and Its Relevance to Chlorocatechol Dioxygenases
1998 · Takuzo Funabiki, Tamio Yamazaki, et al. · Angewandte Chemie International Edition · 51
Structure of Active Species in Alkali-Ion-Modified Silica-Supported Vanadium Oxide
1997 · Sakae Takenaka, Tsunehiro Tanaka, et al. · The Journal of Physical Chemistry B · 51
Lattice dielectric properties of rutile TiO 2 : First-principles anharmonic self-consistent phonon study
2023 · Tomohito Amano, Tamio Yamazaki, et al. · Physical review. B./Physical review. B · 32
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Fluoropolymer resists for 157-nm lithography
2002 · Minoru Toriumi, Naomi Shida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29
Mechanism of oxygenative cleavage of catechols by nonheme iron complexes in relevance to catechol dioxygenases studied by quantum chemical calculations
1999 · Takuzo Funabiki, Tamio Yamazaki · Journal of Molecular Catalysis A Chemical · 25
Chemical bond based machine learning model for dipole moment: Application to dielectric properties of liquid methanol and ethanol
2024 · Tomohito Amano, Tamio Yamazaki, et al. · Physical review. B./Physical review. B · 18
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Resist materials for 157-nm lithography
2001 · Minoru Toriumi, Seiichi Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
157-nm single-layer resists based on advanced fluorinated polymers
2002 · Naomi Shida, Hiroyuki Watanabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Novel main-chain-fluorinated polymers for 157-nm photoresists
2003 · Minoru Toriumi, Meiten Koh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Breakdown of Time–Temperature Superposition in a Bead–Spring Polymer Melt near the Glass Transition Temperature
2014 · Tamio Yamazaki · The Journal of Physical Chemistry B · 11
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Dry-etch resistance of fluorine functionalized polymers
2002 · Meiten Koh, Takuji Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Oxidative Spaltung von Chlorbrenzkatechinen mit molekularem Sauerstoff unter Katalyse durch Nicht-Häm-Eisen(III)-Komplexe und deren Bedeutung als Chlorbrenzkatechin- Dioxygenase-Modellverbindungen
1998 · Takuzo Funabiki, Tamio Yamazaki, et al. · Angewandte Chemie · 10
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Synthesis of novel fluorinated norbornene derivatives for 157-nm application
2003 · Meiten Koh, Takuji Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Characterization of fluoropolymers for 157 nm chemically amplified resist
2001 · Toshiro Itani, Minoru Toriumi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 8
Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers
2003 · Tamio Yamazaki, Takamitsu Furukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Transferability of the chemical-bond-based machine learning model for dipole moment: The GHz to THz dielectric properties of liquid propylene glycol and polypropylene glycol
2025 · Tomohito Amano, Tamio Yamazaki, et al. · Physical review. B./Physical review. B · 3
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Parameterization of Coarse Grained Force Fields for Dynamic Property of Ethylene Glycol Oligomers/water Binary Mixtures
2013 · TAMIO YAMAZAKI · Journal of Theoretical and Computational Chemistry · 3
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157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers
2003 · Shigeo Irie, Seiichi Ishikawa, et al. · Japanese Journal of Applied Physics · 3
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Reticle Critical Dimension Latitude for Fabrication of 0.18 µm Line Patterns
1998 · Seiji Matsuura, Takayuki Uchiyama, et al. · Japanese Journal of Applied Physics · 3
Development of 157 nm Resist Using Highly Exact Theoretical Calculation of Absorption Spectra
2002 · Tamio Yamazaki, Toshiro Itani · Japanese Journal of Applied Physics · 1
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Effect of stage synchronization error of KrF scan on 0.18-μm patterning
1998 · Takayuki Uchiyama, Takeo Hashimoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
An atom-based machine-learned dipole-moment model and application to conjugated systems
2026 · Zhao, Yuansheng, Yamazaki, Tamio, et al. · arXiv (Cornell University)
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First-Principles Study of THz Dielectric Properties with a Machine Learning Model for Dipole Moments
2026 · Tomohito Amano, Tamio Yamazaki, et al. · Springer proceedings in physics
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157-nm Resist Materials Using Main-Chain Fluorinated Polymers
2004 · Toshiro Itani, Hiroyuki Watanabe, et al. · ACS symposium series
157-nm Resist Material Design for Improvement of Its Transparency Using Highly Precise Theoretical Calculation
2003 · Tamio Yamazaki, Toshiro Itani · Japanese Journal of Applied Physics
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Works count: 28
Citation count: 319
H-index: 11
I10-index: 12
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