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Michael C. Smayling

Observed names: M SMAYLING, M. C. Smayling, M. Smayling, M.C. Smayling, Michael C. Smayling Michael C. Smayling, Michael Smayling
OpenAlex ID: A5113576594
Permanent increase of the electrical conductivity of polymers induced by ultraviolet laser radiation
1991 · M. Schumann, R. Sauerbrey, et al. · Applied Physics Letters · 122
Generation of diffraction-free beams for applications in optical microlithography
1997 · M. Erdélyi, Z. L. Horváth, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 77
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Ultraviolet-laser-induced permanent electrical conductivity in polyimide
1993 · T. Feurer, R. Sauerbrey, et al. · Applied Physics A · 72
Low k 1 logic design using gridded design rules
2008 · Michael C. Smayling, Hua-yu Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 53
Device integration for ESD robustness of high voltage power MOSFETs
2002 · C. Duvvury, J. Rodriguez, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 52
Electron beam pumped broad-band diatomic and triatomic excimer lasers
1981 · F. Tittel, G. Marowsky, et al. · IEEE Journal of Quantum Electronics · 47
Blue laser action by the rare-gas halide trimer Kr2F
1980 · F. K. Tittel, M. Smayling, et al. · Applied Physics Letters · 39
The effects of write/erase cycling on data loss in EEPROMs
1985 · D.A. Baglee, M.C. Smayling · Technical digest - International Electron Devices Meeting/Technical digest · 37
E-beam to complement optical lithography for 1D layouts
2011 · David K. Lam, Enden D. Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 34
APF pitch-halving for 22nm logic cells using gridded design rules
2008 · Michael C. Smayling, Christopher Bencher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 30
Dominant formation and quenching kinetics of electron beam pumped Xe2Cl
1981 · G. Marowsky, G. P. Glass, et al. · The Journal of Chemical Physics · 29
32nm and below logic patterning using optimized illumination and double patterning
2009 · Michael C. Smayling, Valery Axelrad · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
Efficient npn operation in high voltage NMOSFET for ESD robustness
2002 · C. Duvvury, D. Briggs, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 25
Interference assisted lithography for patterning of 1D gridded design
2009 · Robert T. Greenway, Rudolf Hendel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21
Lightly doped drain transistors for advanced VLSI circuits
1985 · D.A. Baglee, C. Duvvury, et al. · IEEE Transactions on Electron Devices · 19
16nm with 193nm immersion lithography and double exposure
2010 · Valery Axelrad, Michael C. Smayling · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Sub-12nm optical lithography with 4x pitch division and SMO-lite
2013 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
1D design style implications for mask making and CEBL
2013 · Michael C. Smayling · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
An analytical method for determining intrinsic drain/source resistance of lightly doped drain (LDD) devices
1984 · Charvaka Duvvury, Dave Baglee, et al. · Solid-State Electronics · 15
Improvement of lithographic performance and reduction of mask cost by simple OPC
2012 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i
2011 · Peter De Bisschop, Bart Laenens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Series resistance modeling for optimum design of LDD transistors
1983 · C. Duvvury, D.A. Baglee, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 14
22nm logic lithography in the presence of local interconnect
2010 · Michael C. Smayling, Robert J. Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
ESD circuit synthesis and analysis using TCAD and SPICE
2002 · J. Rodriguez, M.C. Smayling, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 13
Sub-20nm logic lithography optimization with simple OPC and multiple pitch division
2012 · Michael C. Smayling, Valery Axelrad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Works count: 85
Citation count: 960
H-index: 16
I10-index: 27
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