Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
Year: 2004
Type: conference-paper
DOI: 10.1117/12.556538
Authors: Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Kevin Bradley, Rene Delano, Paul Denham, Bob Gunion, Bruce Harteneck, Brian Hoef, Hanjing Huang, Keith Jackson, Gideon Jones, Drew Kemp, James A. Liddle, Ron Oort, Al Rawlins, Senajith Rekawa, Farhad Salmassi, Ron Tackaberry, Carl Chung, Layton Hale, Don Phillion, Gary Sommargren, John Taylor
Language: Dutch
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2061963067