Work

Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography

Year: 2001

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1408950

Authors: M. Fritze, B. Tyrrell, D. Astolfi, D. Yost, P. Davis, B. Wheeler, R. Mallen, J. Jarmolowicz, S. Cann, D. Chan, P. Rhyins, C. Carney, J. Ferri, B. A. Blachowicz

Institutions: MIT Lincoln Laboratory, Massachusetts Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: U.S. Department of Defense, Defense Advanced Research Projects Agency

OpenAlex ID: W2083224486

FWCI: 1.255

Cites: 12

Cited by: 11

Related to: 10