Year: 2008
Type: conference-paper
Abstract: Recent experimental results and modeling both indicate that whereas it is possible to optimize a photoresist and process to achieve separately a desired resolution or line edge roughness or sensitivity, it will be difficult if not impossible to achieve all three simultaneously using current standard chemically amplified photoresists and processes. This tradeoff among Resolution, Line Edge Roughness (LER) and Sensitivity is termed the RLS tradeoff. Here we review the progress to date of a SEMATECH-funded program to develop an experimentally verified model of the relationship among resolution, LER and sensitivity and use it to determine approaches for "breaking" the RLS tradeoff.
DOI: 10.1117/12.772763
Authors: Gregg M. Gallatin, Patrick Naulleau, Dimitra Niakoula, Robert Brainard, Elsayed Hassanein, Richard Matyi, Jim Thackeray, Kathleen Spear, Kim Dean
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W2083672051