Investigation of CVD SiCOH low-k time-dependent dielectric breakdown at 65nm node technology
Year: 2005
Type: conference-paper
Authors: F. Chen, K. Chanda, I. Gill, M. AngyaI, J. Demarest, T. Sullivan, R. Kontra, M. Shinosky, J. Li, L. Economikos, M. Hoinkis, S. Lane, D. McHerron, M. Inohara, S. Boettcher, D. Dunn, M. Fukasawa, B.C. Zhang, K. Ida, T. Ema, G. Lembach, K. Kumar, Y. Lin, H. Maynard, K. Urata, T. Bolom, K. Inoue, J. Smith, Y. Ishikawa, M. Naujok, P. Ong, A. Sakamoto, D. Hunt, J. Aitken
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2145411134