Work

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

Year: 2017

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2257662

Authors: Kaustuve Bhattacharyya, Arie den Boef, Marc Noot, Omer Adam, Grzegorz Grzela, Andreas Fuchs, Martin Jak, Sax Liao, Ken Chang, Vincent Couraudon, Eason Su, Wilson Tzeng, Cathy Wang, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Y. C. Wang, Kevin Cheng, Chih-Ming Ke, L. G. Terng

Institutions: ASML (Netherlands), Taiwan Semiconductor Manufacturing Company (Taiwan)

Language: English

Topic: Advanced Measurement and Metrology Techniques

Subfield: Mechanical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2601315129

FWCI: 5.145

Cites: 6

Cited by: 16

Related to: 10