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Koichi Hontake
Observed name:
Koichi HONTAKE
Institution:
Tokyo Electron Kyushu Ltd (Japan)
Observed institutions:
Tokyo Electron (Japan),
Tokyo Electron Kyushu Ltd (Japan),
Kumamoto University
OpenAlex ID:
A5031294436
EUV patterning successes and frontiers
2016
·
Nelson Felix
, Dan Corliss
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
28
Defect detection strategies and process partitioning for single-expose EUV patterning
2018
·
Luciana Meli
, Karen Petrillo
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
13
Driving down defect density in composite EUV patterning film stacks
2017
·
Luciana Meli
, Karen Petrillo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
Preparation and Surface Activities of Cotelomers of Acrylic Acid and n-Octyl, 2-Ethylhexyl or 2-Phenylethyl Acrylate.
2001
·
Tomokazu YOSHIMURA
, Koichi HONTAKE
, et al.
·
Journal of Oleo Science
·
5
PDF
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
2017
·
Eric Liu
, Akiteru Ko
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
4
Defect detection strategies and process partitioning for SE EUV patterning (Conference Presentation)
2018
·
Shinichiro Kawakami
, Luciana Meli
, et al.
·
Extreme Ultraviolet (EUV) Lithography
·
3
Copper Plating Method on Flat Surface for High Frequency Signal Transfer
2005
·
Koichi Hontake
, Yasuhiro Wakizaka
, et al.
·
Japanese Journal of Applied Physics
·
3
CD uniformity improvement for sub 20 nm DRAM process with negative tone development
2020
·
Yu-Chen Lin
, Mifong Wu
, et al.
·
Advances in Patterning Materials and Processes
Metal containing material processing on coater/developer system
2016
·
Shinichiro Kawakami
, Hiroshi Mizunoura
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
9
Citation count:
69
H-index:
4
I10-index:
3
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