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Defect detection strategies and process partitioning for SE EUV patterning (Conference Presentation)

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Year: 2018
Type: conference-paper
Source: Extreme Ultraviolet (EUV) Lithography
DOI: 10.1117/12.2297362
Authors: Shinichiro Kawakami, Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson M. Felix, Chris Robinson, Benjamin Briggs, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Barry Saville, Chet Lenox, Shravan Matham, Eric Liu, Ko Akiteru, HeungSoo Choi
Institutions: Tokyo Electron Kyushu Ltd (Japan), IBM (United States), KLA (United States)
Language: English

Topic: Advancements in Photolithography Techniques
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
SDG: Industry, innovation and infrastructure

Open Access status: closed
OpenAlex ID: W2791410134
FWCI: 1.201
Cites: 11
Cited by: 3
Related to: 10
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