Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
Chunshan Zhao
Institution:
Shanghai Huali Microelectronics (China)
Observed institution:
Shanghai Huali Microelectronics (China)
OpenAlex ID:
A5035122172
Improved EM Performance by Adjusting Etching Profile of Top Metal for 28HK Metal Gate Process
2024
·
Zherui Cao
, Chunshan Zhao
, et al.
·
China Semiconductor Technology International Conference (CSTIC)
Reducing Side Cutting During Wet Etching of Gate Oxide Layer for 28HK Metal Gate Process
2024
·
Chunshan Zhao
, Wei Zhou
, et al.
·
China Semiconductor Technology International Conference (CSTIC)
The Influence of the Film Adjustment for Deep Trench Isolation (DTI) Filling on the Thermal Quality in CMOS Image Sensor
2022
·
Yaguo Cai
, Chunshan Zhao
, et al.
·
China Semiconductor Technology International Conference (CSTIC)
Quantum Efficiency Enhancement by Optimizing BST Design for NIR CMOS Sensor
2022
·
Chunshan Zhao
, Wuzhi Zhang
, et al.
·
China Semiconductor Technology International Conference (CSTIC)
Suppression of TSV Leakage of Stacking CIS by Optimizing TSV Profile and Uniformity
2022
·
Zherui Cao
, Weiwei Yu
, et al.
·
China Semiconductor Technology International Conference (CSTIC)
Reduction of random telegraph signal noise by optimizing deep trench isolation process for backside illuminated CMOS image sensor
2021
·
Chunshan Zhao
, Bai Kang
, et al.
·
China Semiconductor Technology International Conference (CSTIC)
Show more works
View as search
Works count:
6
Citation count:
H-index:
I10-index:
Year
Topic
Type
