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Kazunori K. Shinoda

Three-dimensional microscopy by optical scanning holography
1995 · Ting-Chung Poon, Kyu B. Doh, et al. · Optical Engineering · 161
Optical scanning holography
1996 · Ting-Chung Poon, Ming Hsien Wu, et al. · Proceedings of the IEEE · 80
40-Gb/s Direct Modulation With High Extinction Ratio Operation of 1.3-$\mu$m InGaAlAs Multiquantum Well Ridge Waveguide Distributed Feedback Lasers
2007 · K. Nakahara, T. Tsuchiya, et al. · IEEE Photonics Technology Letters · 79
Twin-image elimination experiments for three-dimensional images in optical scanning holography
2000 · T.-C. Poon, T. Kim, et al. · Optics Letters · 79
Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate
2017 · Nobuya Miyoshi, Hiroyuki Kobayashi, et al. · Japanese Journal of Applied Physics · 62
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25-Gb/s Multichannel 1.3-$\mu$m Surface-Emitting Lens-Integrated DFB Laser Arrays
2011 · Koichiro Adachi, Kazunori Shinoda, et al. · Journal of Lightwave Technology · 45
High-power highly-reliable operation of 0.98-μm InGaAs-InGaP strain-compensated single-quantum-well lasers with tensile-strained InGaAsP barriers
1995 · M. Sagawa, T. Toyonaka, et al. · IEEE Journal of Selected Topics in Quantum Electronics · 44
Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation
2019 · Taku Iwase, Yoshito Kamaji, et al. · Japanese Journal of Applied Physics · 43
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Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride
2019 · Kazunori Shinoda, Nobuya Miyoshi, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 41
Thermal cyclic etching of silicon nitride using formation and desorption of ammonium fluorosilicate
2016 · Kazunori Shinoda, Masaru Izawa, et al. · Applied Physics Express · 40
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Effective suppression of beam divergence for a high-power laser diode bar by an external-cavity technique
2004 · Xin Gao, Yujin Zheng, et al. · Optics Letters · 40
Real-time two-dimensional holographic imaging by using an electron-beam-addressed spatial light modulator
1993 · T.-C. Poon, M. H. Wu, et al. · Optics Letters · 32
Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing
2017 · K Shinoda, N Miyoshi, et al. · Journal of Physics D Applied Physics · 30
Beam-shaping technique for improving the beam quality of a high-power laser-diode stack
2006 · Xin Gao, Hiroyuki Ohashi, et al. · Optics Letters · 30
12.5-Gb/s Direct Modulation Up to 115 $^circrm C$ in 1.3- $murm m$ InGaAlAs-MQW RWG DFB Lasers With Notch-Free Grating Structure
2004 · K. Nakahara, T. Tsuchiya, et al. · Journal of Lightwave Technology · 28
Wide Temperature Range Operation of 25-Gb/s 1.3-μm InGaAlAs Directly Modulated Lasers
2011 · Toshihiko Fukamachi, Koichiro Adachi, et al. · IEEE Journal of Selected Topics in Quantum Electronics · 27
Characterization of the Refractive Index of Strained GaInNAs Layers by Spectroscopic Ellipsometry
1998 · Takeshi Kitatani, Masahiko Kondow, et al. · Japanese Journal of Applied Physics · 27
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Uncooled CWDM 25-Gbps EA/DFB Lasers for Cost-Effective 100-Gbps Ethernet Transceiver over 10-km SMF Transmission
2008 · Shigeki Makino, Hiroaki Hayashi, et al. · Optical Fiber Communication Conference · 26
Microchannel spatial light modulator having the functions of image zooming, shifting, and rotating
1986 · Tsutomu Hara, K. Shinoda, et al. · Applied Optics · 26
Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF 3 /O 2 downstream plasma
2019 · Kazunori Shinoda, Nobuya Miyoshi, et al. · Journal of Physics D Applied Physics · 25
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High power COD-free operation of 0.98 µm InGaAs/GaAs/InGaPlasers with non-injection regions near the facets
1994 · M. Sagawa, K. Hiramoto, et al. · Electronics Letters · 23
Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si
2021 · Nobuya Miyoshi, Kazunori Shinoda, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 22
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3
2021 · Nobuya Miyoshi, Hiroyuki Kobayashi, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 20
Isotropic atomic layer etchings of various materials by using dry chemical removal
2022 · Hiroto Ohtake, Nobuya Miyoshi, et al. · Japanese Journal of Applied Physics · 19
Thermal-cyclic atomic layer etching of cobalt with smooth etched surface by plasma oxidation and organometallization
2022 · Sumiko Fujisaki, Yoshihide Yamaguchi, et al. · Applied Physics Letters · 19
Works count: 156
Citation count: 1,602
H-index: 22
I10-index: 46
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