Get started
Author

Sunggon Jung

Observed names: S. G. Jung, Sung-Gon Jung, Sung-gon Jung, SungGon Jung
OpenAlex ID: A5083182271
Gate-all-around Twin Silicon nanowire SONOS Memory
2007 · Sung Dae Suk, Kyoung Hwan Yeo, et al. · Symposium on VLSI Technology · 31
Hotspot fixing using ILT
2011 · Woojoo Sim, Sunggon Jung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Enhancing fullchip ILT mask synthesis capability for IC manufacturability
2011 · Thomas Cecil, Chris Ashton, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?
2017 · Kafai Lai, Chi-Chun Liu, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 14
Comparison of double patterning technologies in NAND flash memory with sub-30nm node
2009 · Byungjoon Hwang, Jeehoon Han, et al. · European Solid-State Device Research Conference · 7
E-beam writing time improvement for inverse lithography technology mask for full-chip
2010 · Guangming Xiao, Dong Hwan Son, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Assessments on process parameters' influences to the proximity correction
2004 · Eun-Mi Lee, Sung-Woo Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Effectiveness and confirmation of local area flare measurement method in various pattern layouts
2002 · Dongseok Nam, Eunmi Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Improving model prediction accuracy for ILT with aggressive SRAFs
2010 · Sunggon Jung, Woojoo Sim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT
2006 · In-Sung Kim, Sungsoo Suh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Attainable road to the lower-k 1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
2002 · Insung Kim, Sung-gon Jung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Application of source mask optimization in inverse lithography technology for multiple patterns
2009 · Hyo-chan Kim, Sung-gon Jung, et al.
AF fixer: new incremental OPC method for optimizing assist feature
2008 · Sung-Gon Jung, Sang-Wook Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Improving model-based OPC performance for sub-60nm devices using real source optical model
2006 · Sunggon Jung, In-Sung Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
The application criterion of model-based optical proximity correction in a low k1 process
2005 · Doo-Youl Lee, In-Sung Kim, et al. · Optical Microlithography XVIII
Works count: 15
Citation count: 101
H-index: 6
I10-index: 4
Year
Topic
Type