Work

Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.655482

Authors: In-Sung Kim, Sungsoo Suh, Sunggon Jung, Eunmi Lee, Young-Seog Kang, Sukjoo Lee, Sang-Gyun Woo, HanKu Cho

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008367265

FWCI:

Cites:

Cited by: 2

Related to: 10