Author

Franck Foussadier

Observed name: F. Foussadier

Institution: STMicroelectronics (France)

Observed institution: STMicroelectronics (France)

OpenAlex ID: A5110015010

A 55 nm triple gate oxide 9 metal layers SiGe BiCMOS technology featuring 320 GHz fT / 370 GHz fMAX HBT and high-Q millimeter-wave passives

2014 · P. Chevalier, G. Avenier, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 200

PD-SOI CMOS and SiGe BiCMOS Technologies for 5G and 6G communications

2020 · P. Chevalier, F. Gianesello, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 19

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

2007 · Mazen Saied, Franck Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Study of SRAF placement for contact at 45 nm and 32 nm node

2008 · V. Farys, F. Robert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Resist 3D model based OPC for 28nm metal process window enlargement

2016 · P. Fanton, J. C. Le Denmat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Demonstration of an effective flexible mask optimization (FMO) flow

2012 · Charlotte Beylier, Nicolas Martin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Tracking of design related defects hidden by random defectivity in production environment

2010 · J. C. Le Denmat, V. Charbois, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Process control for 45 nm CMOS logic gate patterning

2008 · Bertrand Le Gratiet, Pascal Gouraud, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window

2007 · M. Saied, F. Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Outliers detection by fuzzy classification method for model building

2009 · Mame Kouna Top, Yorick Trouiller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

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Sensitivity of a variable threshold model toward process and modeling parameters

2006 · Mazen Saied, Franck Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Model-based mask verification on critical 45nm logic masks

2008 · F. Sundermann, F. Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Characterization of inverse SRAF for active layer trenches on 45-nm node

2007 · Jean-Christophe Urbani, Jean-Damien Chapon, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Analysis of the diffraction pattern for optimal assist feature placement

2007 · Amandine Borjon, Jérôme Belledent, et al. · Microelectronic Engineering · 2

65nm OPC and design optimization by using simple electrical transistor simulation

2005 · Yorick Trouiller, Thierry Devoivre, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Impact of modelisation pixel size on OPC consistency

2009 · Franck Foussadier, Emek Yesilada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

2007 · Frank Sundermann, Yorick Trouiller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Etch modeling for model-based optical proximity correction for 65nm node

2007 · Christian Gardin, Jérôme Belledent, et al. · Microelectronic Engineering · 1

Correction of long-range effects applied to the 65-nm node

2005 · Jerome Belledent, James Word, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Convergence study for lines, spaces between standard OPC, local, and more holistic OPC

2011 · L. Perraud, Y. Trouiller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy

2005 · Christophe Couderc, Jerome Belledent, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 21

Citation count: 273

H-index: 4

I10-index: 3