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Kouichi Ono Kouichi Ono

Observed name: Kouichi ONO
Institution: Kyoto University
OpenAlex ID: A5110186838
Step Coverage and Electrical Properties of (Ba, Sr)TiO3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)2
1994 · Takaaki Kawahara, Mikio Yamamuka, et al. · Japanese Journal of Applied Physics · 101
(Ba, Sr)TiO3 Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes
1996 · Takaaki Kawahara, Mikio Yamamuka, et al. · Japanese Journal of Applied Physics · 94
Surface Morphologies and Electrical Properties of (Ba, Sr)TiO3 Films Prepared by Two-Step Deposition of Liquid Source Chemical Vapor Deposition
1995 · Takaaki Kawahara, Mikio Yamamuka, et al. · Japanese Journal of Applied Physics · 74
Reaction Mechanism and Electrical Properties of (Ba,Sr)TiO3 Films Prepared by Liquid Source Chemical Vapor Deposition
1996 · Mikio Yamamuka, Takaaki Kawahara, et al. · Japanese Journal of Applied Physics · 44
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Preparation of (Ba, Sr)TiO3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
1994 · Takaaki Kawahara, Mikio Yamamuka, et al. · Japanese Journal of Applied Physics · 38
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Mechanisms for Microscopic Nonuniformity in Low-Pressure, High-Density Plasma Etching of Poly-Si in Cl2 and Cl2/O2 Mixtures
1997 · Mutumi Tuda Mutumi Tuda, Kouichi Ono Kouichi Ono · Japanese Journal of Applied Physics · 32
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Thermal Desorption Spectroscopy of (Ba, Sr)TiO3 Thin Films Prepared by Chemical Vapor Deposition
1996 · Mikio Yamamuka, Takaaki Kawahara, et al. · Japanese Journal of Applied Physics · 19
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Profile Evolution during Cold Plasma Beam Etching of Silicon
1997 · Kouichi Ono Kouichi Ono, Mutumi Tuda Mutumi Tuda · Japanese Journal of Applied Physics · 18
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A Mass Spectrometric Study of Reaction Mechanisms in Chemical Vapor Deposition of (Ba, Sr)TiO3 Films
1997 · Mikio Yamamuka, Takaaki Kawahara, et al. · Japanese Journal of Applied Physics · 18
\bfiIn situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy
1995 · Kazuyasu Nishikawa Kazuyasu Nishikawa, Kouichi Ono Kouichi Ono, et al. · Japanese Journal of Applied Physics · 18
In Situ Fourier Transform Infrared Measurements of Si Surface and Bulk Plasmas in Cl2/O2 and HBr/O2 Electron Cyclotron Resonance Plasma Etching: Influence of Oxygen on Reaction Products
1996 · Kazuyasu Nishikawa Kazuyasu Nishikawa, Tatsuo Oomori Tatsuo Oomori, et al. · Japanese Journal of Applied Physics · 12
Observation of Microscopic Nonuniformity during Overetch in Polysilicon Gate Etching
1997 · Mutumi Tuda Mutumi Tuda, Kouichi Ono Kouichi Ono · Japanese Journal of Applied Physics · 10
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Influence of Buffer Layers and Barrier Metals on Properties of (Ba, Sr)TiO3 Films Prepared by Liquid Source Chemical Vapor Deposition
1997 · Takaaki Kawahara, Mikio Yamamuka, et al. · Japanese Journal of Applied Physics · 9
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Profile Evolution during Pulsed Plasma Etching
1996 · Mutumi Tuda Mutumi Tuda, Kouichi Ono Kouichi Ono · Japanese Journal of Applied Physics · 9
Transport and Deposition Processes of Sputtered Particles in RF-Microwave Hybrid Sputtering Discharges
1994 · Mutumi Tuda, Kouichi Ono Kouichi Ono, et al. · Japanese Journal of Applied Physics · 5
Anisotropic Etching of n+-Polysilicon Using Beam Plasmas Generated by Gas Puff Plasma Sources
1995 · Tatsuo Oomori, Masakazu Taki, et al. · Japanese Journal of Applied Physics · 3
Various Phenomena on PSI. PSI in Plasma Processing Devices. Plasma Etching.
1999 · Kouichi ONO · プラズマ・核融合学会誌 · 2
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Works count: 17
Citation count: 506
H-index: 11
I10-index: 12
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