Author

Hiroaki Kawata

Observed names: H. Kawata, Hiroaki KAWATA, Hiroaki Kawata Hiroaki Kawata, Kawata, Hiroaki

Institution: Osaka Metropolitan University

Observed institutions: Osaka Prefecture University, Japan Science and Technology Agency, Osaka Metropolitan University, The University of Osaka

OpenAlex ID: A5111607306

Optical projection lithography using lenses with numerical apertures greater than unity

1989 · Hiroaki Kawata, James M. Carter, et al. · Microelectronic Engineering · 56

Fabrication of 1∕4 wave plate by nanocasting lithography

2005 · Takashi Yoshikawa, Takaaki Konishi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 46

Study of the spatial distribution of backscattered electrons from a gold target with a new Monte Carlo simulation

1995 · M. Yasuda, H. Kawata, et al. · Journal of Applied Physics · 43

Process-simulation system for UV-nanoimprint lithography

2010 · Mayuko Shibata, Akira Horiba, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 36

Site-specific nanopatterning of functional metallic and molecular arbitrary features in nanofluidic channels

2015 · Yan Xu, Nobuhiro Matsumoto, et al. · Lab on a Chip · 35

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Computational study on polymer filling process in nanoimprint lithography

2011 · Masaaki Yasuda, Kosei Araki, et al. · Microelectronic Engineering · 31

Effects of Mold Side Wall Profile on Demolding Characteristics

2010 · Hiroaki Kawata, Kensuke Kubo, et al. · Japanese Journal of Applied Physics · 29

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Analysis of Charging Phenomena of Polymer Films on Silicon Substrates under Electron Beam Irradiation

2008 · Masaaki Yasuda, Kosuke Morimoto, et al. · Japanese Journal of Applied Physics · 29

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Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study

2010 · Akihiro Taga, Masaaki Yasuda, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 26

Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography

2012 · Akira Horiba, Masaaki Yasuda, et al. · Japanese Journal of Applied Physics · 25

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Silicon template fabrication for imprint process with good demolding characteristics

2008 · Hiroaki Kawata, Masato Matsue, et al. · Microelectronic Engineering · 25

Time dependent analysis of the resist deformation in thermal nanoimprint

2007 · Yoshihiko Hirai, Yuki Onishi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 25

Fabrication of Si mold with smooth side wall by new plasma etching process

2007 · Hiroaki Kawata, Masaaki Yasuda, et al. · Microelectronic Engineering · 25

Multi-layered resist process in nanoimprint lithography for high aspect ratio pattern

2006 · Takaaki Konishi, Hisao Kikuta, et al. · Microelectronic Engineering · 25

Three-dimensional multilayered microstructure fabricated by imprint lithography

2005 · H. Ooe, M. Morimatsu, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 25

Studies of energy dissipation in resist films by a Monte Carlo simulation based on the Mott cross section

1987 · K. Murata, H. Kawata, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 25

Simulation study on the template release mechanism and damage estimation for various release methods in nanoimprint lithography

2013 · Takahiro Shiotsu, Naoki Nishikura, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 24

Fabrication of 0.2 µm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens

1992 · Hiroaki Kawata, Ippei Matsumura, et al. · Japanese Journal of Applied Physics · 23

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Micro-nano mixture patterning by thermal-UV novel nanoimprint

2007 · Keisuke Okuda, Naoyuki Niimi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 22

Fine pattern transfer by nanocasting lithography

2005 · Yoshihiko Hirai, Takashi Yoshikawa, et al. · Microelectronic Engineering · 22

A novel template-release method for low-defect nanoimprint lithography

2014 · Takuya Kitagawa, Naoto Nakamura, et al. · Microelectronic Engineering · 20

Resist heating effect in electron beam lithography

1994 · M. Yasuda, H. Kawata, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 20

Molecular simulation of pattern formation in electron beam lithography

2013 · Masaaki Yasuda, Hirofumi Sakai, et al. · Microelectronic Engineering · 19

Time-dependent charge distributions in polymer films under electron beam irradiation

2008 · Masaaki Yasuda, Yasuaki Kainuma, et al. · Journal of Applied Physics · 18

Fabrication of a New Electrostatic Linear Actuator

2000 · Takashi Matsunaga, Kazuya Kondoh, et al. · Japanese Journal of Applied Physics · 17

Works count: 183

Citation count: 1,400

H-index: 20

I10-index: 54