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Author

James Snow

Observed name: J. Snow
Institution: IMEC
Observed institution: IMEC
OpenAlex ID: A5111905337
CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach
2005 · K.G. Anil, P. Verheyen, et al. · Symposium on VLSI Technology · 23
Demonstration of recessed SiGe S/D and inserted metal gate on HfO/sub 2/ for high performance pFETs.
2006 · P. Verheyen, G. Eneman, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 21
Integration challenges for multi-gate devices
2005 · N. Collaert, S. Brus, et al. · IEEE International Conference on IC Design and Technology (ICICDT) · 11
Roadblocks and Critical Aspects of Cleaning for Sub-65nm Technologies
2006 · Paul Mertens, G. Vereecke, et al. · IEEE International Power Modulator Symposium and High-Voltage Workshop (IPMHVC) · 4
Germanium Deep-Submicron p-FET and n-FET Devices, Fabricated on Germanium-On-Insulator Substrates
2007 · M. Meuris, B. Jaeger, et al. · Springer eBooks · 2
Works count: 5
Citation count: 61
H-index: 4
I10-index: 3
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