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Eddy Latu-Romain

Observed names: E Latu-Romain, E. Latu-Romain, E. Romain-Latu, Eddy Lattu-Romain, Latu-Romain, E., Latu-Romain, Eddy
Observed institutions: Centre National de la Recherche Scientifique, Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Micro and Nanotechnology Innovation Centre, CEA Grenoble, Science et Ingénierie des Matériaux et Procédés, Laboratoire des Technologies de la Microélectronique, Laboratoire d'Électronique des Technologies de l'Information, Laboratoire d’Electrochimie et de Physico-chimie des Matériaux et des Interfaces, Université Grenoble Alpes
OpenAlex ID: A5113519920
Pulsed Transfer Etching of PS–PDMS Block Copolymers Self-Assembled in 193 nm Lithography Stacks
2014 · Cécile Girardot, Sophie Böhme, et al. · ACS Applied Materials & Interfaces · 47
A generic approach for vertical integration of nanowires
2008 · E Latu-Romain, P Gilet, et al. · Nanotechnology · 25
Surface-induced p-type conductivity in ZnO nanopillars investigated by scanning probe microscopy
2010 · E. Latu-Romain, P. Gilet, et al. · Journal of Applied Physics · 14
Roughness generation during Si etching in Cl2 pulsed plasma
2016 · Odile Mourey, Camille Petit-Etienne, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 11
Local strain measurements in shallow trench insulator structures using near-ultraviolet Raman spectroscopy: Simulation and experiment
2007 · Eddy Latu-Romain, Michel Mermoux, et al. · Journal of Applied Physics · 10
Evidence of relationship between mechanical stress and leakage current in AlGaN/GaN transistor after storage test
2012 · B. Lambert, N. Labat, et al. · Microelectronics Reliability · 9
Optical and electrical characterizations of vertically integrated ZnO nanowires
2008 · E. Latu-Romain, P. Gilet, et al. · Microelectronics Journal · 7
Growth and characterization of ZnO nanowires on p-type GaN
2008 · I.C. Robin, M. Lafossas, et al. · Microelectronics Journal · 7
Growth of a 3C-SiC layer by carburization of silicon nanopillars
2014 · M. Ollivier, L. Latu-Romain, et al. · Materials Letters · 6
Roughness generation during Si etching in Cl2 pulsed plasmas
2016 · Mourey, Odile, Petit-Etienne, Camille, et al. · HAL
Development of plasma etching processes for the integration of III-V semicondutors as trigate nMOSFET’s channels
2016 · Bizouerne, M., Pargon, E., et al. · HAL
Physical Properties Investigation of Arsenic Based III-V Materials Grown on Nanopatterned Si(100) Substrates
2015 · Cipro, R., Martin, M., et al. · HAL
Plasma wall interaction in H2 plasma processes
2014 · Dubois, J, Posseme, N., et al. · HAL
Plasma etching of sub-14nm holes in silicon using PS-b-PMMA block-copolymer masks.
2014 · Bézard, P., Cunge, G., et al. · HAL
Integration of high-χ PS-b-PDMS in industry-type photolithography stacks for high resolution lithography processes
2014 · Böhme, S., Girardot, C., et al. · HAL
Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma
2014 · Mourey, Odile, Petit-Etienne, C., et al. · HAL
Si3N4 spacers etching in synchronized pulsed CH3F/O2/He/SiF4 plasmas
2013 · Blanc, R., Darnon, Maxime, et al. · HAL
On the cracks formation in AlN films grown by chlorinated High Temperature Chemical Vapor Deposition.
2010 · Latu-Romain, E., Claudel, A., et al. · HAL
ZnO nanowires for solid state lightening: from epitaxy and collective integration to optical and electrical characterization
2008 · E. Latu-Romain, P. Gilet, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Semiconductor nanowires for solid state lighting: simulation, epitaxy, integration, optical and electrical characterization
2007 · F. Levy, Y. Desieres, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 22
Citation count: 136
H-index: 7
I10-index: 5
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