Work

Pulsed Transfer Etching of PS–PDMS Block Copolymers Self-Assembled in 193 nm Lithography Stacks

Year: 2014

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/am504475q

Authors: Cécile Girardot, Sophie Böhme, Sophie Archambault, Mathieu Salaün, Eddy Latu-Romain, Gilles Cunge, Olivier Joubert, Marc Zelsmann

Institutions: Centre National de la Recherche Scientifique, Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Laboratoire des Technologies de la Microélectronique, Laboratoire d'Électronique des Technologies de l'Information, Université Grenoble Alpes

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: European Commission, Agence Nationale de la Recherche

Awards: Large Area Molecularly Assembled Nanopatterns for Devices, G309771913

OpenAlex ID: W2332846641

FWCI: 2.963

Cites: 32

Cited by: 47

Related to: 10