Author

Christophe Defranoux

Observed names: C Defranoux, C. Defranoux, Christophe DEFRANOUX, Christopher Defranoux, DEFRANOUX, Christophe, Defranoux, C., Defranoux, Christophe

Observed institutions: Sopra (France), Semilab (Hungary)

OpenAlex ID: A5113545462

Modeling the short-circuit current density of polymer solar cells based on P3HT:PCBM blend

2006 · Florent Monestier, Jean-Jacques Simon, et al. · Solar Energy Materials and Solar Cells · 303

Selective epitaxial growth of boron- and phosphorus-doped Si and SiGe for raised sources and drains

2004 · J.M Hartmann, L Clavelier, et al. · Journal of Crystal Growth · 74

Ellipsométrie - Théorie

2003 · Frank BERNOUX, Jean-Philippe PIEL, et al. · 63

Optical modeling of organic solar cells based on CuPc and C_60

2008 · Florent Monestier, Jean-Jacques Simon, et al. · Applied Optics · 45

Optical characterization of the coloration process in electrochromic amorphous and crystalline WO3 films by spectroscopic ellipsometry

2016 · Guangzhong Yuan, Chenzheng Hua, et al. · Applied Surface Science · 40

In Situ Phosphorus Doping of Germanium by APCVD

2006 · Gabriela Dilliway, Ruud Van Den Boom, et al. · ECS Transactions · 27

PDF

High quality transparent conductive electrodes in organic photovoltaic devices

2009 · M. Chakaroun, B. Lucas, et al. · Thin Solid Films · 22

VUV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

2004 · P Boher, C Defranoux, et al. · Materials Science and Engineering B · 22

High accuracy IR ellipsometer working with a Ge Brewster angle reflection polarizer and grid analyzer

1998 · Michel Luttmann, Jean-Louis Stehle, et al. · Thin Solid Films · 19

Study of annealing effects upon the optical and electrical properties of SnO2:F/SiCxOy low emissivity coatings by spectroscopic ellipsometry

2013 · Kangkai Wang, Bo Cheng, et al. · Thin Solid Films · 17

Pulsed Plasma Deposition from Vinyltrimethylsilane/Oxygen Mixtures

2008 · Adriano Francescangeli, Fabio Palumbo, et al. · Plasma Processes and Polymers · 15

Accurate electrical activation characterization of CMOS ultra-shallow profiles

2004 · T. Clarysse, F. Dortu, et al. · Materials Science and Engineering B · 15

Dielectric function of Si nanocrystals embedded in SiO2

2004 · B. Gallas, Chih-Cheng Kao, et al. · Thin Solid Films · 14

Ellipsometry study of process deposition of amorphous Indium Gallium Zinc Oxide sputtered thin films

2015 · C. Talagrand, X. Boddaert, et al. · Thin Solid Films · 11

Inkjet-printed vertically emitting solid-state organic lasers

2016 · Oussama Mhibik, Sébastien Chénais, et al. · Journal of Applied Physics · 9

PDF

Tensile-strained Si layers grown on Si0.6Ge0.4and Si0.5Ge0.5virtual substrates: I. Film thickness and morphology

2007 · J M Hartmann, A Abbadie, et al. · Semiconductor Science and Technology · 9

Ellipsométrie - Instrumentation et applications

2003 · Frank BERNOUX, Jean-Philippe PIEL, et al. · 8

Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI

2004 · C. Defranoux, T. Emeraud, et al. · Thin Solid Films · 7

Physical characterization of mixed HfAlO layers by complementary analysis techniques

2004 · H Bender, Th Conard, et al. · Materials Science and Engineering B · 7

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

1999 · Pierre Boher, Christophe Defranoux, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Deep ultra-violet measurements of SiON anti-reflective coatings by spectroscopic ellipsometry

1998 · Christophe Defranoux, Jean-Philippe Piel, et al. · Thin Solid Films · 7

Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

1996 · Pierre Boher, Jean-Philippe Piel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

2000 · Pierre Boher, Jean-Philippe Piel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Infrared spectroscopic ellipsometry applied to the characterization of nano-structures of silicon IC manufacturing

2004 · P Boher, M Bucchia, et al. · Thin Solid Films · 4

Single-Shot Excimer Laser Annealing and In Process Ellipsometry Analysis for Ultra Shallow Junctions

2002 · T. Noguchi, G. Kerrien, et al. · MRS Proceedings · 4

Works count: 80

Citation count: 793

H-index: 13

I10-index: 14