Work

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.386494

Authors: Pierre Boher, Jean-Philippe Piel, Patrick Evrard, Christophe Defranoux, Marta Espinosa, Jean-Louis P. Stehle

Language: English

Topic: Optical Polarization and Ellipsometry

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4232034439

FWCI: 1.696

Cites:

Cited by: 5

Related to: 10