Author

Jean-Louis P. Stehle

Observed names: J Stehle, Jean-Louis STEHLÉ, Jean-Louis Stehle, Jean-Louis Stehlé, Jean‐Louis Stehlé

Institution: Sopra (France)

Observed institutions: Koç University, Sopra (France), Semilab (Hungary)

OpenAlex ID: A5110144627

High-speed broadband FTIR system using MEMS

2014 · N. Pelin Ayerden, Ugur Aygun, et al. · Applied Optics · 28

High accuracy IR ellipsometer working with a Ge Brewster angle reflection polarizer and grid analyzer

1998 · Michel Luttmann, Jean-Louis Stehle, et al. · Thin Solid Films · 19

Sensitivity enhancement for evanescent-wave sensing using cavity-ring-down ellipsometry

2013 · Dimitris Sofikitis, Katerina Stamataki, et al. · Optics Letters · 12

IR spectroscopic ellipsometry: instrumentation and applications in semiconductors

1993 · Gilbert Zalczer, Olivier Thomas, et al. · Thin Solid Films · 10

Ellipsométrie - Instrumentation et applications

2003 · Frank BERNOUX, Jean-Philippe PIEL, et al. · 8

Unconditionally stable indole-derived glass blends having very high photorefractive gain: the role of intermolecular interactions

2008 · Rocco Angelone, Francesco Ciardelli, et al. · Applied Optics · 7

New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

1999 · Pierre Boher, Christophe Defranoux, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Deep ultra-violet measurements of SiON anti-reflective coatings by spectroscopic ellipsometry

1998 · Christophe Defranoux, Jean-Philippe Piel, et al. · Thin Solid Films · 7

Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

1996 · Pierre Boher, Jean-Philippe Piel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Ellipsometric retrieval of the phenomenological parameters of a waveguide grating

2009 · David Pietroy, Olivier Parriaux, et al. · Optics Express · 5

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

2000 · Pierre Boher, Jean-Philippe Piel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Extreme ultraviolet reflectors with metal–oxide multilayered structures

1986 · Jean-Pierre Delaboudiniere, Tran Khanh Vien, et al. · Applied Optics · 5

MEMS FTIR spectrometer and optical results

2012 · N. Pelin Ayerden, Jean-Louis Stehle, et al. · International Conference on Optical MEMS and Nanophotonics · 4

IR spectroscopic ellipsometry for industrial characterization of semiconductors

2001 · Pierre Boher, Marc Bucchia, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Infrared spectroscopic ellipsometry in semiconductor manufacturing

2004 · Pierre-Yves Guittet, Ulrich Mantz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

2000 · Pierre Boher, Christopher Pickering, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry

1997 · Pierre Boher, Jean-Louis P. Stehle, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

2001 · Pierre Boher, Patrick Evrard, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

2000 · Pierre Boher, Patrick Evrard, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

1999 · Pierre Boher, Christophe Defranoux, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Broadband UV small-spot spectroscopic ellipsometer

1995 · Timothy R. Piwonka-Corle, Torsten R. Kaack, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Variable angle spectroscopic ellipsometry for deep UV characterization of dielectric coatings

1994 · Alexander Zuber, Norbert Kaiser, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Multi-pass spectroscopic ellipsometry

2013 · Jean-Louis Stehle, Peter C. Samartzis, et al. · Thin Solid Films · 1

Precise and accurate characterization of DUV and V-UV phase shifting mask materials by combined V-UV spectroscopic ellipsometry and x-ray reflectometry

2002 · Pierre Boher, Adrien Darragon, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Phase-shifting interference microscope for the characterization of metallic interconnections of flat panel displays

2001 · Pierre Boher, Jean-Philippe Piel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Works count: 52

Citation count: 153

H-index: 7

I10-index: 4