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Larry Zhuang

Observed names: L. Zhuang, Larry L. Zhuang
OpenAlex ID: A5113572485
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
2012 · S. Narasimha, P. Chang, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 95
Scaling of 32nm low power SRAM with high-K metal gate
2008 · H. S. Yang, R. Wong, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 53
High performance 32nm SOI CMOS with high-k/metal gate and 0.149µm 2 SRAM and ultra low-k back end with eleven levels of copper
2006 · B. Greene, Qingqing Liang, et al. · Symposium on VLSI Technology · 39
Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)
2011 · Guillaume Landie, Yongan Xu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26
Lithographic benefits and mask manufacturability study of curvilinear masks
2018 · Alexander Wei, Wei Guo, et al. · SPIE Photomask Technology Conference · 21
Monolithic Stacked FET with Stepped Channels for Future Logic Technologies
2024 · Chen Zhang, SeungMin Song, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 15
Subresolution assist features impact and implementation in extreme ultraviolet lithography for next-generation beyond 7-nm node
2018 · Vivian Wei Guo, Fan Jiang, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 9
OMOG mask topography effect on lithography modeling of 32nm contact hole patterning
2010 · Lei Yuan, Wenzhan Zhou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
SRAF requirements, relevance, and impact on EUV lithography for next-generation beyond 7nm node
2018 · Wei Guo, Fan Jiang, et al. · Extreme Ultraviolet (EUV) Lithography · 3
Feasibility study of machine learning modeling for full chip optical proximity correction
2022 · Yuping Cui, Jing Xue, et al. · DTCO and Computational Patterning · 1
Works count: 10
Citation count: 267
H-index: 7
I10-index: 6
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