Get started
Author

A. K. Stamper

Observed names: A.K Stamper, A.K. Stamper, Anthony K Stamper, Anthony K. Stamper, Anthony Stamper
OpenAlex ID: A5113582055
Reduced electromigration of Cu wires by surface coating
2002 · C.-K. Hu, L. Gignac, et al. · Applied Physics Letters · 215
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits
1999 · D. R. Cote, S. V. Nguyen, et al. · IBM Journal of Research and Development · 104
Line edge roughness and spacing effect on low-k TDDB characteristics
2008 · F. Chen, J. R. Lloyd, et al. · IEEE International Reliability Physics Symposium proceedings · 49
Single target sputtering of superconducting YBa2Cu3O7−δ thin films on Si (100)
1989 · M. Migliuolo, A. K. Stamper, et al. · Applied Physics Letters · 43
Sub-0.25-micron interconnection scaling: damascene copper versus subtractive aluminum
2002 · A.K. Stamper, T.L. McDevitt, et al. · ASMC proceedings · 42
Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM
1995 · D. R. Cote, S. V. Nguyen, et al. · IBM Journal of Research and Development · 39
Characterization of yttria-stabilized zirconium oxide buffer layers for high-temperature superconductor thin films
1988 · J-W. Lee, T. E. Schlesinger, et al. · Journal of Applied Physics · 39
Planar MEMS RF capacitor integration
2011 · A. K. Stamper, C. V. Jahnes, et al. · International Conference on Solid-State Sensors, Actuators and Microsystems · 29
Plasma-induced gate-oxide charging issues for sub-0.5 μm complementary metal–oxide–semiconductor technologies
1995 · A. K. Stamper, J. B. Lasky, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 29
Hysteresis model for polycrystalline high-T c superconductors
1988 · D. D. Stancil, T. E. Schlesinger, et al. · Journal of Applied Physics · 18
Advanced wiring RC delay issues for sub-0.25-micron generation CMOS
2002 · A.K. Stamper, M.B. Fuselier, et al. · IEEE International Interconnect Technology Conference (IITC) · 17
Deposition of textured yttria-stabilized ZrO2 films on oxidized silicon
1991 · A. K. Stamper, D. W. Greve, et al. · Journal of Applied Physics · 17
Characterization of Plasma‐Enhanced Chemical Vapor Deposited Nitride Films Used in Very Large Scale Integrated Applications
1993 · A. K. Stamper, S. L. Pennington · Journal of The Electrochemical Society · 16
Low-field structure in the magnetization of polycrystalline YBa2Cu3O7−x and ErBa2Cu3O7−x
1988 · D. Wong, A. K. Stamper, et al. · Applied Physics Letters · 15
A high-resistivity SiGe BiCMOS technology for WiFi RF front-end-IC solutions
2013 · Alvin Joseph, Jeff Gambino, et al. · IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM) · 14
Electromigration Reliability of Advanced Interconnects
2007 · C.-K. Hu, L. M. Gignac, et al. · AIP conference proceedings · 13
Effects of failure criteria on the lifetime distribution of dual-damascene Cu line/via on W
2004 · R. F. Liu, C.-K. Hu, et al. · Journal of Applied Physics · 12
Substrate contamination effects in the processing of chemically amplified DUV photoresists
1994 · John L. Sturtevant, Steven J. Holmes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Plasma charging damage in SOI technology
2002 · A.C. Mocuta, T.B. Hook, et al. · International Symposium on Plasma Process-Induced Damage · 8
Gate dielectric integrity and reliability in 0.5- mu m CMOS technology
1993 · A.W. Strong, A.K. Stamper, et al. · IEEE International Reliability Physics Symposium proceedings · 7
Dielectric charging in MEMS with dielectric-dielectric contacts
2013 · D. Molinero, C. Shen, et al. · International Conference on Solid-State Sensors, Actuators and Microsystems · 6
Dual gate oxide charging damage in damascene copper technologies
2002 · A.K. Stamper, A. Chou, et al. · International Symposium on Plasma Process-Induced Damage · 6
Influence of Y2O3ZrO2 buffer layers on sputtered films of YBa2Cu3O6+x
1989 · D.W Greve, A.K Stamper, et al. · Materials Science and Engineering A · 6
High-resistivity SiGe BiCMOS technology development
2014 · Anthony Stamper, Renata Camillo-Castillo, et al. · IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM) · 5
On-axis sputter deposition of superconducting YBa2Cu3O7-δ on Si(100)
1991 · A. K. Stamper, D. W. Greve, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 5
Works count: 37
Citation count: 780
H-index: 14
I10-index: 17
Year
Topic
Type