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N. Kasai
Observed names:
N. KASAI,
NAOKI KASAI,
Naoki KASAI,
Naoki Kasai,
Naoki Kasai Naoki Kasai,
直記 笠井
show all 6
Institutions:
Tohoku University,
Center for Innovative Integrated Electronic Systems, Tohoku University
Observed institutions:
NEC (Japan),
Waseda University,
Tohoku University,
Stanford SystemX Alliance,
Semiconductor Leading Edge Technologies, Inc (Japan),
Center for Innovative Integrated Electronic Systems, Tohoku University,
Stanford University
show all 7
OpenAlex ID:
A5113667570
Nonvolatile Magnetic Flip-Flop for Standby-Power-Free SoCs
2009
·
Noboru Sakimura
, Tadahiko Sugibayashi
, et al.
·
IEEE Journal of Solid-State Circuits
·
175
Current-induced domain wall motion in perpendicularly magnetized CoFeB nanowire
2011
·
S. Fukami
, T. Suzuki
, et al.
·
Applied Physics Letters
·
156
Current-induced effective field in perpendicularly magnetized Ta/CoFeB/MgO wire
2011
·
T. Suzuki
, S. Fukami
, et al.
·
Applied Physics Letters
·
155
10.5 A 90nm 20MHz fully nonvolatile microcontroller for standby-power-critical applications
2014
·
Noboru Sakimura
, Yukihide Tsuji
, et al.
·
Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference
·
109
Magnetic tunnel junction for nonvolatile CMOS logic
2010
·
Hideo Ohno
, Tetsuo Endoh
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
86
A 30-ns 64-Mb DRAM with built-in self-test and self-repair function
1992
·
A. Tanabe
, T. Takeshima
, et al.
·
IEEE Journal of Solid-State Circuits
·
81
Recent Progress of Perpendicular Anisotropy Magnetic Tunnel Junctions for Nonvolatile Vlsi
2012
·
SHOJI IKEDA
, HIDEO SATO
, et al.
·
SPIN
·
75
Comprehensive study of CoFeB-MgO magnetic tunnel junction characteristics with single- and double-interface scaling down to 1X nm
2013
·
H. Sato
, T. Yamamoto
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
65
Hot-electron immunity of SiO/sub 2/ dielectrics with fluorine incorporation
1989
·
P.J. Wright
, N. Kasai
, et al.
·
IEEE Electron Device Letters
·
61
Nonvolatile Magnetic Flip-Flop for standby-power-free SoCs
2008
·
Noboru Sakimura
, Tadahiko Sugibayashi
, et al.
·
Custom Integrated Circuits Conference
·
58
A Preparation of Perpendicular Magnetic Recording Media by an Electroless Plating Method
1983
·
Tetsuya Osaka
, Naoki Kasai
, et al.
·
Journal of The Electrochemical Society
·
58
PDF
Selective silicon epitaxial growth for device-isolation technology
1986
·
Akihiko Ishitani
, Hiroshi Kitajima
, et al.
·
Microelectronic Engineering
·
54
20-nm magnetic domain wall motion memory with ultralow-power operation
2013
·
S. Fukami
, M. Yamanouchi
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
52
An effective channel length determination method for LDD MOSFETs
1996
·
K. Takeuchi
, N. Kasai
, et al.
·
IEEE Transactions on Electron Devices
·
46
A capacitor-over-bit-line (COB) cell with a hemispherical-grain storage node for 64 Mb DRAMs
2002
·
M. Sakao
, N. Kasai
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
42
A 30-ns 256-Mb DRAM with a multidivided array structure
1993
·
T. Sugibayashi
, T. Takeshima
, et al.
·
IEEE Journal of Solid-State Circuits
·
40
Nonvolatile Crossbar Switch Using $\hbox{TiO}_{x}/ \hbox{TaSiO}_{y}$ Solid Electrolyte
2010
·
Munehiro Tada
, Toshitsugu Sakamoto
, et al.
·
IEEE Transactions on Electron Devices
·
38
A 90nm 12ns 32Mb 2T1MTJ MRAM
2009
·
R. Nebashi
, N. Sakimura
, et al.
·
Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference
·
36
Evaluation of Transistor Property Variations Within Chips on 300-mm Wafers Using a New MOSFET Array Test Structure
2004
·
N. Izumi
, H. Ozaki
, et al.
·
IEEE Transactions on Semiconductor Manufacturing
·
36
Facet Formation in Selective Silicon Epitaxial Growth
1985
·
Akihiko Ishitani
, Hiroshi Kitajima
, et al.
·
Japanese Journal of Applied Physics
·
33
PDF
A Study on Electroless Plating of Cobalt Alloy Films for Perpendicular Recording
1983
·
Tetsuya Osaka
, Naoki Kasai
, et al.
·
Journal of The Electrochemical Society
·
33
A content addressable memory using magnetic domain wall motion cells
2011
·
Ryusuke Nebashi
, Noboru Sakimura
, et al.
·
Symposium on VLSI Circuits
·
31
Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions
2012
·
Keizo Kinoshita
, Tadashi Yamamoto
, et al.
·
Japanese Journal of Applied Physics
·
30
High-speed and reliable domain wall motion device: Material design for embedded memory and logic application
2012
·
S. Fukami
, M. Yamanouchi
, et al.
·
Symposium on VLSI Technology
·
30
Improvement of Thermal Stability of Magnetoresistive Random Access Memory Device with SiN Protective Film Deposited by High-Density Plasma Chemical Vapor Deposition
2008
·
Katsumi Suemitsu
, Yuichi Kawano
, et al.
·
Japanese Journal of Applied Physics
·
28
PDF
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Works count:
117
Citation count:
2,172
H-index:
27
I10-index:
49
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