Author

Konrad Jarausch

Observed names: K Jarausch, K. F. Jarausch, K. Jarausch, K.F. Jarausch, KF Jarausch, Konrad F. Jarausch

Observed institutions: Intel (United States), North Carolina State University, St. Olaf College, Hitachi High-Tech (Japan), Stanford University

OpenAlex ID: A5113698090

Fast, Completely Reversible Li Insertion in Vanadium Pentoxide Nanoribbons

2007 · Candace K. Chan, Hailin Peng, et al. · Nano Letters · 392

Synthesis and Characterization of Phase-Change Nanowires

2006 · Stefan Meister, Hailin Peng, et al. · Nano Letters · 146

Hyperbranched Lead Selenide Nanowire Networks

2007 · Jia Zhu, Hailin Peng, et al. · Nano Letters · 131

Four-dimensional STEM-EELS: Enabling nano-scale chemical tomography

2009 · Konrad Jarausch, Paul Thomas, et al. · Ultramicroscopy · 101

Initial stages of yield in nanoindentation

1999 · J. D. Kiely, K. F. Jarausch, et al. · Journal of materials research/Pratt's guide to venture capital sources · 57

Chemically and geometrically enhanced focused ion beam micromachining

1998 · P. E. Russell, T. J. Stark, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 56

Nuclear electric quadrupole moment of 6Li

1998 · J. Cederberg, D. Olson, et al. · Physical Review A · 44

Defect-dependent Elasticity: Nanoindentation as a Probe of Stress State

2000 · K. F. Jarausch, J. D. Kiely, et al. · Journal of materials research/Pratt's guide to venture capital sources · 23

Three-dimensional electron microscopy of individual nanoparticles

2008 · K. Jarausch, D. N. Leonard · Journal of Electron Microscopy · 22

Silicon structures for in situ characterization of atomic force microscope probe geometry

1996 · K. F. Jarausch, T. J. Stark, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 20

The hyperfine spectrum of LiF

1992 · James Cederberg, Duane Olson, et al. · Journal of Molecular Spectroscopy · 16

Force probe characterization using silicon three-dimensional structures formed by focused ion beam lithography

1994 · K. M. Edenfeld, K. F. Jarausch, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 15

Bottom-up sample preparation technique for interfacial characterization of vertically aligned carbon nanofibers

2006 · Yusuke Ominami, Quoc Ngo, et al. · Ultramicroscopy · 7

Strain Measurements Using Nano-Beam Diffraction on a FE-STEM

2007 · C Vartuli, K Jarausch, et al. · Microscopy and Microanalysis · 6

The Newly Installed Aberration Corrected and Dedicated STEM (Hitachi HD2700C) at Brookhaven National Laboratory

2008 · H Inada, Y Zhu, et al. · Microscopy and Microanalysis · 4

The development and characteristics of a high-speed EELS mapping system for a dedicated STEM

2008 · S. Isakozawa, K. Kaji, et al. · Journal of Electron Microscopy · 4

Uranium Single Atom Imaging And EELS Mapping using Aberration Corrected Scanning Transmission Electron Microscope and LN2 Cold Stage

2008 · H Inada, J Wall, et al. · Microscopy and Microanalysis · 3

Site Specific 2-D Implant Profiling Using FIB Assisted SCM

2002 · Konrad Jarausch, John F. Richards, et al. · Proceedings - International Symposium for Testing and Failure Analysis · 3