Work

Dielectric and structural properties of thin SrHfO3 layers on TiN

Year: 2008

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.3049611

Authors: G. Lupina, G. Kozłowski, J. Dabrowski, P. Dudek, G. Lippert, H.-J. Müssig

Institution: Leibniz Institute for High Performance Microelectronics

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1665645693

FWCI: 4.082

Cites: 24

Cited by: 40

Related to: 10