Work

Enable abrupt junction and advanced salicide formation with dynamic surface annealing

Year: 2012

Type: article

Source: Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics

DOI: 10.1002/pssc.201200435

Authors: Shiyu Sun, Shankar Muthukrishnan, Ben Ng, Stephen Nagy, Alan Zojaji, Rubi Lapena, Yihwan Kim, Vivek Rao, Dimitry Kouzminov, Naushad Variam, Stephen Moffatt, Adam Brand

Institution: Applied Materials (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1761451963

FWCI:

Cites:

Cited by: 5

Related to: 10