Work

Optimization of CVD dielectric process to achieve reliable ultra low-k air gaps

Year: 2002

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(01)00590-1

Authors: Vincent Arnal, Joaquin Torres, Jean-Philippe Reynard, Philippe Gayet, Christophe Vérove, Marc Guillermet, Philippe Spinelli

Institutions: STMicroelectronics (France), Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W1972036263

FWCI: 0.437

Cites: 4

Cited by: 9

Related to: 10