Work

Enhanced I-line resist profiles through the use of an intermediate development bake

Year: 1990

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/0167-9317(90)90090-g

Authors: N. Samarakone, P. Jaenen, L. Van den hove

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W1974478286

FWCI: 0.468

Cites: 2

Cited by: 1

Related to: 10