Deposition of AlN at lower temperatures by atmospheric metalorganic chemical vapor deposition using dimethylethylamine alane and ammonia
Year: 1995
Type: article
DOI: 10.1116/1.579812
Authors: J. N. Kidder, J. S. Kuo, A. Ludviksson, T. P. Pearsall, J. W. Rogers, John M. Grant, Lynn R. Allen, Sheng Teng Hsu
Institution: University of Washington
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: National Science Foundation
OpenAlex ID: W1978458976